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sputter-coater-for-sem-sample-preparation
  • Sputter Coater for SEM Sample Preparation DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation

    DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation Introduction   Compact Automatic Ion Sputtering Coater (SD800 Model) that is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate using Time Control. Vacuum pump is included.   Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuuming time < 2 Min Chamber size Φ115*100mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 40kg/307mm length x 260mm wide x 260mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support    

  • Sputter Coater for SEM Sample Preparation Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation

    Magnetron Ion Thermal Evaporation Carbon Sputter Coater for SEM Sample Preparation Introduction     Magnetron Ion Sputtering Unit &Thermal Evaporation Carbon Coater is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.     SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.     Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.     Vacuum pump is included.     Chiller is optional. (for Magnetron Ion Sputtering Unit)   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 100mA Max evaporation current 100A Working pressure 20Pa -8 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Evaporation target source Target material:carbon rope /target source:carbon rope Operation method Instruction Manual (2 units)Weight/size 55kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Cooling method Air cooling(Evaporation)+water cooling (sputtering ) Warranty One year limited warranty with lifetime product support

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