Input Power

· AC 220V, 50/60 Hz, (110VAC available upon request )

· Power 350 W Max.

Environment Requirement

· Indoor Use Only; Altitude Use Up To 5,500 Feet;

· Temperature Range 41-104 Degrees Fahrenheit;

· Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;

· Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;

· Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV Lamp

· Solid metal double wave mercury lamp 

· Wave Length: 253.7nm and 184.9nm 

· UV lamp service life:  5000 hrs

· UV light area: 200 x 200 mm 

· Can clean crystal wafer with a diameter up to 12“ x 35 mm thickness.

· The UV lamp is shipped separately with the machine to avoid potential transportation damage.

Chamber & Sample Stage

· Stainless steel case

· Sliding drawer for easy sample loading

· Sample stage area is 310 mm x 320 mm ( ~12"x12" )

· Max. sample thickness: 40 mm

· Ozone venting device is built in the chamber

· Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

· The sample stage is heatable up to 150ºC with the precision temperature controller

· The temperature controller is 20 segments programmable with +/-2 C accuracy

· Temperature uniformity:<10C within 6 inches diameter area; <20C within 12 inches diameter

· Heating rate: 15C max. 

· The distance between the sample stage and lamp is adjustable from 20mm  to 40mm.

Vent Port

· 3 in. the diameter vent port is built in the back of the machine

· One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Dimension

· 510mm x 350mm x 400mm (W x H x D)

Net Weight

· 62 lbs

Shipping Weight & Dimensions

· 160 lbs

· 47" x 39" x 32"

Warranty

2-years limited warranty with lifetime support. The fragile UV lamp is not included in the warranty.

Application

· Clean silicon wafer, Gallium Arsenide wafer, quartz  and ITO glass

· Clean all types of oxide single crystal substrate such as sapphire, STO, and LAO.

· Clean gold and Pt surface

· An oxidizing surface of a light metallic material

· Activate Polymers and Crosslink Polymers

· UV Strip Photo Resist / Photoresist

· UV Clean Production Line LED displays