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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
PVD Thin Film Deposition Coating Machine System For Metals And Organics
Model Number:
TMAX-PD-ZD01Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
Previous:
Dual-Source Vacuum Deposition Coating System Evaporation CoaterNext:
Small Carbon Film Deposition Coater for SEM &EDS Sample Preparation
PVD Thin Film Deposition Coating Machine System For Metals And Organics
TMAX-PD-ZD01-High-Vacuum Evaporation Coating System
Product Overview
This system is a compact, multi-source high-vacuum evaporation coating platform designed for laboratory use, capable of depositing thin films of metals, organics, and other functional materials. It is ideal for:
· Research labs (metal electrode fabrication, SEM sample preparation).
· Advanced materials development (organic thin films).
· Process optimization (high-precision coatings for novel material synthesis).
Key Advantages vs. Competing Systems
Feature |
This System |
Typical Competing Systems |
Vacuum Speed |
15–20 min to high vacuum (≤5×10⁻⁵ Pa) |
Often 30+ min for similar vacuum levels. |
Film Uniformity |
±3%–5% thickness deviation |
Typically ±5%–10% in entry-level models. |
Chamber Material |
304 stainless steel (high corrosion resistance) |
Some use aluminum or lower-grade steel. |
Modularity |
Supports 1–3 evaporation sources (expandable) |
Fixed configurations common in low-end systems. |
Footprint |
Compact (500×360×420mm for desktop model) |
Larger benchtop units often >600×500mm. |
Technical Specifications
Parameter |
Specification |
Vacuum Chamber |
304 stainless steel, cylindrical (Φ260×H350 mm) |
Internal Coating Area |
~Φ260×H310 mm |
Ultimate Vacuum |
≤5×10⁻⁵ Pa |
Pumping Speed |
≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours |
Substrate Stage |
- Max size: 80×80 mm (standard) / 120 mm diameter (rotary) - Rotation: 0–20 RPM (magnetic fluid sealed) |
Film Uniformity |
<5% (120 mm diameter area) |
Evaporation Sources |
2–3 sources (metal/organic compatible, co-evaporation or switching) |
Power Supply |
2 kW, constant current/power modes |
Electrical |
AC 220 V / 50 Hz, 3.5 kW |
Dimensions (L×W×H) |
- Main unit: 600×500×900 mm - Desktop model: 500×360×420 mm |
Why This System Stands Out?
1. Speed & Efficiency
o Achieves high vacuum 50% faster than comparable models, reducing idle time.
2. Precision Engineering
o Stainless steel chamber + optimized gas paths ensure minimal contamination and long-term stability.
3. Flexible Configurations
o Modular design allows easy upgrades (e.g., adding a third evaporation source).
4. Space-Saving
o 30% smaller footprint than conventional systems, critical for crowded labs.
Ideal For:
✔ Universities studying thin-film physics.
✔ R&D centers developing flexible electronics or OLEDs.
✔ Industrial labs requiring high-repeatability coatings.
Order Note: Minimum 1 unit. Custom configurations available.
+86 13174506016
David@tmaxcn.com
