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- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film
Model Number:
TMAX-ZY-ZD01Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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Small Lab Vacuum Sputtering & Thermal Evaporation Evaporator Coater For Metal Film Preparation
Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film
TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films
Product Overview
The TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training.
Key Features & Advantages
1. Wide Application Range
· Materials Research: Metal films, dielectric layers, polymer coatings.
· Functional Devices: Thin-film sensors, optical coatings, nanoelectronics.
· Multi-Layer Deposition: Supports up to 99 layers in a single run.
2. User-Friendly Operation
· Plug-and-play design—no specialized lab environment required.
· 10-inch touchscreen for intuitive control and process monitoring.
· Preloaded 100+ deposition recipes for quick setup.
3. High Precision & Stability
· Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity).
· Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum.
· 3 independent evaporation sources prevent material cross-contamination.
4. Flexible Configuration
· Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage.
· Automatic & manual modes for customized process control.
5. Low Maintenance & Compact Design
· Aluminum chamber for efficient heat dissipation.
· 65 kg weight, suitable for benchtop use in labs or offices.
Technical Specifications
Parameter |
Specification |
Chamber |
Ø300 × 350(h) mm (quartz glass) |
Vacuum System |
300L/s turbomolecular pump + dual-stage rotary pump |
Ultimate Vacuum |
≤6 × 10⁻⁵ Pa (after baking) |
Leak Rate |
≤5.0 × 10⁻⁹ Pa·L/s |
Deposition Rate |
≥10 nm/min (material-dependent) |
Film Uniformity |
≤3% (with rotation) |
Evaporation Sources |
3 independent thermal sources |
Max Layers per Run |
99 layers (up to 4 materials) |
Control Interface |
10" touchscreen with programmable recipes |
Power Supply |
AC 230V, 32A, 50Hz |
Cooling Water (Optional) |
0.2 MPa, 15–25°C, ≥8 L/min |
Operational Workflow
1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation.
2. Multi-Layer Control: Supports time-based or thickness-based deposition modes.
3. Remote Monitoring: Adjust parameters via network connection.
Why Choose?
✔ Combines research-grade performance with desktop convenience.
✔ Minimal training required—ideal for multi-user environments.
✔ Scalable for both experimental and small production needs.





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David@tmaxcn.com