Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science

Vacuum Thermal Evaporating Carbon Coating Coater for Materials Science   Introduction Thermal Evaporation Carbon Coater (SD800C Model) is ideal and designed for lab SEM sample preparation. SD800C Model carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.      Vacuum pump is included. Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h 2.6 L/s) Vacuum limit 2Pa Max evaporation current 100A Working pressure 6Pa -4 Pa Vacuuming tme < 5 Min( 2Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass  Evaporation target source Target material :carbon rope/target source:carbon rope Operation method Instruction Manua Weight/size 45kg/340mm length x 390mm wide x 300mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support  

Automatic Pulsing Thermal Evaporator Carbon Coater equipped with Vacuum Pump for Lab SEM Sample Preparation

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Benchtop Vacuum Thermal Evaporating Carbon Coater or SEM Sample Coater

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

High Vacuum Thermal Evaporation Coater With Three Kinds Of Evaporation Head Heat Evaporation Carbon Rod Molybdenum Boat Tungsten Wire Bar

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Manual & Auto Lab Sputter Coater for Low Temperature SEM Carbon Preparation

Manual & Auto Lab Sputter Coater for Low Temperature SEM Carbon Preparation   Model: TMAX-BY-JS01 DC Ion Sputtering Coater Introduction The TMAX-BY-JS01 Ion Sputtering Coater is designed for high-quality SEM sample preparation. Compared to conventional sputtering systems, it features magnetron sputtering technology, making it suitable for temperature-sensitive samples (e.g., thin films, rubber). The system offers automatic/manual operation modes, adjustable vacuum control, and auto-venting functionality, with optional rotary sample stage compatibility. Its user-friendly interface and stable performance make it ideal for universities and research institutes.     Key Specifications Parameter Value Dimensions (Main Unit) 510mm (L) × 310mm (W) × 290mm (H) Target Material Au, 50mm (D) × 0.1mm (H) Sample Chamber Glass chamber, Ø180mm × 120mm (H) Sample Stage Diameter Ø70mm (rotary stage optional) Target Size Ø50mm Ultimate Vacuum 1 Pa Operating Vacuum 2–15 Pa Sputtering Current 0–50 mA (adjustable) Timer Digital, 0–600 sec Coating Area 50mm diameter Deposition Rate 0–60 nm/min Vacuum Measurement Pirani gauge Touchscreen 4-inch HMI interface Gas Compatibility Supports multiple gases Mechanical Pump VRD-8 Power Consumption 100 W     Features & Applications 1. Magnetron Sputtering Technology · Enables low-temperature coating for delicate samples (e.g., polymers, biological specimens). · Stable target design ensures uniform film deposition. 2. Dual Operation Modes · Automatic mode: Streamlines repetitive tasks. · Manual mode: Offers flexibility for customized protocols. 3. Adjustable Sputtering Modes · Standard/gentle startup accommodates sensitive materials. 4. Intelligent Vacuum Control · Auto-pressure stabilization eliminates manual adjustments and reduces coarse grain formation. 5. User-Friendly Interface · Simplified/advanced UI options cater to users of all experience levels. 6. Optional Rotary Stage · Enhances coating uniformity for complex geometries.     Typical Applications · SEM sample preparation (metals, ceramics, polymers). · Thin-film deposition for research in materials science, life sciences, and nanotechnology.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }

Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment

Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment      Model: TMAX-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater 1. Product Overview Introduction The TMAX-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality. Key Technologies & Advantages ✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating. ✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment. ✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating. ✔ Vacuum Protection System – Safeguards against low-vacuum short circuits. ✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min). 2. Technical Specifications Core Parameters Category Specification Model TMAX-BY-ZD02 Dimensions (W×D×H) 390mm × 310mm × 290mm Chamber Material Borosilicate Glass (Ø160mm × 110mm H) Sample Stage 50mm (Diameter) Evaporation Source High-Purity Carbon Rope Deposition Modes Flash / Pulsed (0-9 pulses programmable) Max Evaporation Current 80A Operating Vacuum 4–6 Pa Ultimate Vacuum 5 Pa Pump Type 2-Stage Rotary Pump (VRD-8, 8 m³/h @50Hz) Power Supply 220V AC, 50Hz Power Consumption 1.6 kW Weight ~50 kg Vacuum System Performance · Pumping Speed: o 50Hz: 8 m³/h (2.2 L/s) o 60Hz: 9.6 m³/h (2.6 L/s) · Time to Reach Vacuum: <5 minutes (to 2 Pa) · Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar 3. Applications · High-Resolution SEM/TEM – Minimizes charging effects. · EBSD Analysis – Enhances electron backscatter diffraction signals. · X-ray Microanalysis – Provides conductive layers with minimal interference. 4. Operational Highlights Pulsed Evaporation Technology · Reduces Debris: Short pulses limit carbon splashing for cleaner coatings. · Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition. User-Centric Design · Touchscreen Interface: Intuitive control for current/pulse adjustment. · No Process Gas Required: Simplified operation compared to sputtering systems.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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