Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological

Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological       Model: TMAX-ZK-JS03-Coater for Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological Product Highlights · User-friendly LCD touchscreen for simplified operation · Fully automated vacuum process for sample preparation · Automatic gas release for safe handling · Wide sputtering current range (5–45mA) for flexible applications · High sputtering efficiency for fast, uniform coating · Ultra-fine particle size (6–10nm) for superior film quality · No sample surface heating—ideal for temperature-sensitive materials Applications Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including: · SEM sample preparation · Electrode material research · Battery separators, filtration membranes · Biological specimens & delicate substrates Technical Specifications Core Parameters Parameter Specification Sputtering Current 5–45mA (adjustable) Operating Mode Fully automatic magnetron sputtering Sputtering Voltage 600V (fixed) Target Materials Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb Vacuum Level <1Pa Vacuum Pump Oil-sealed rotary vane pump (1L/s); optional dry scroll pump Additional Features · Chamber Dimensions: Ø128×130mm · Sample Holders: 1×Ø90mm, 4×Ø25mm, 6×Ø15mm cups · Power Supply: 220V/50Hz (110V customizable) · Max Power Consumption: 450W · Particle Size: 6–10nm · Working Gas: Air or argon · Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa) Key Advantages · Uniform, fine-grained coatings with excellent adhesion · Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials) · Compact glovebox-compatible design for inert-atmosphere processing Why Choose? This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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