High Vacuum Magnetron Sputtering System With Multi-target For Compound Multilayer Films Deposition

High Vacuum Magnetron Sputtering System With Multi-target For Compound Multilayer Films Deposition     Model: TMAX-PD-JS03-Multi-target For Multilayer Films Deposition Product Overview The TMAX-PD-JS03 magnetron sputtering system is designed for scientific research institutions and university laboratories. Featuring core components system offers stable performance, high automation, and serves as a competitive alternative to imported equipment. Key Features 1. Versatile Sputtering Modes ·Compatible with both DC and RF sputtering sources, enabling deposition of metallic, non-metallic, and compound thin films. ·Supports multi-layer and composite film deposition for advanced material research. 2. Superior Film Quality ·Delivers excellent uniformity (±3%~5%) and repeatability for metals, semiconductors, and insulating materials. 3. Optimized Configuration ·Equipped with three 3-inch circular target guns, mounted in a co-focal upward sputtering arrangement. ·Adjustable sputtering area: 2–4 inches (compatible with 2–3 inch targets). Technical Specifications Parameter Value / Description System Dimensions (L×W×H) 850 × 1100 × 1900 mm Chamber Dimensions (L×W×H) 400 × 400 × 380 mm Substrate Stage Max temperature: 600°C (±5°C accuracy) Ultimate Vacuum ≤ 5 × 10−5 Pa Pump-down & Holding ≤ 8 × 10−4 Pa in 30 min; ≤ 8 Pa over 12 hours Uniformity Better than ±3%–5% Target Configuration 3 guns (2–3 inch), 2–4 inch deposition area Application Scope This is ideal for depositing nitrides, oxides, and other functional films, catering to: · Semiconductor research (e.g., conductive/dielectric layers). · Optical coatings (anti-reflective, protective films). · Advanced materials (multilayer structures, composite films). Installation Notes 1. Leveling: Ensure absolute horizontal alignment using a spirit level to guarantee film uniformity. 2. Connections: Securely attach power, cooling water, and vacuum pipelines, checking all seals for leaks. 3. Inspection: Verify no physical damage occurred during transit. Working Principle The system utilizes glow discharge of inert gases to generate ionized particles. These particles bombard the target surface, ejecting atoms/molecules that condense on the substrate to form thin films. Secondary electrons sustain plasma, enhancing deposition efficiency. Why Choose? · Reliability: Premium components ensure long-term stability. · Flexibility: Dual-mode sputtering for diverse materials. · Precision: Tight temperature/vacuum control for reproducible results.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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