Lab Plasma Cleaner Machine of Perovskite Solar Cell Equipment Optional 5L Mechanical Pump

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Stainless Steel Vacuum Plasma Cleaner with 2L Chamber Capacity

Stainless Steel Vacuum Plasma Cleaner with 2L Chamber Capacity   Product Introduction: The plasma cleaning machine is a high-tech dry processing equipment that uses plasma to clean, activate, etch and modify the surface of materials. It is widely used in precision manufacturing, semiconductors, healthcare, electronics and new energy fields. It can handle various materials such as metals, plastics, rubber, glass, and high-molecular materials. It enhances surface performance: not only can it clean, but also improve the wettability, adhesion and coating adhesion of the materials.   The plasma cleaning machine is mainly composed of three parts: 1. Control unit: It includes power frequencies of 40KHz, 13.56MHz, and 2.45GHz, as well as the system control system. 2. (Buttons, PLC, touch screens, etc.). 3. Vacuum chamber: Made of stainless steel, it is used to hold samples and maintain a vacuum environment. 4. Vacuum pump: It is divided into dry pumps and oil pumps, which are used to evacuate the air to support plasma generation.   Advantages: Environmental protection: No use of harmful solvents, no liquid discharge, it belongs to green cleaning technology. Efficiency: The cleaning process only takes a few minutes and can reach deep into the micropores and internal parts of complex structures. Safety: It avoids the harm to the human body caused by chemical reagents. Technical parameters: 1. Chamber size: 160*160*90mm 2. Tray size: 130*130mm (two interchangeable) 3. Chamber material: 304 stainless steel with surface treatment 4. Overall size: approximately 470*410*430mm 5. Chamber volume: 2L 6. Power frequency: 40KHz 7. Power supply capacity: 0~1000W adjustable continuously 8. Flow meters: two high-precision float flow meters 9. Control process: fully automatic or manual (PLC human-machine interface) 10. Control system: 7-inch display, PLC control (Omron/UCON) 11. Cleaning time: 0~99999s adjustable 12. Vacuum degree: 1~30Pa 13. Chamber temperature: <60℃ 14. Power supply voltage: 220V 15. Vacuum pump: 10m3/h (oil pump)  

10 Layer Electrode 120L High Volume Plasma Cleaner

10 Layer Electrode 120L High Volume Plasma Cleaner  Product Introduction: The plasma cleaning machine is a high-tech dry processing equipment that uses plasma to clean, activate, etch and modify the surface of materials. It is widely used in precision manufacturing, semiconductors, healthcare, electronics and new energy fields. It can handle various materials such as metals, plastics, rubber, glass and high-molecular materials. It enhances surface performance: not only can it clean, but also can improve the wettability, adhesion and coating adhesion of the materials. KT-DL120L Plasma Cleaning Machine Technical Specifications: No. Item Specification 1 Equipment Overall Dimension 1150×1050×1750 mm 2 Chamber Dimension 644×500×500 mm 3 Chamber Volume 120 L 4 Number of Electrode Plates 10 layers 5 Loading Tray Size 505×370 mm 6 Electrode Fixing Method Plug-in, detachable 7 Distance from Loading Tray to Electrode Plate 12.5 mm 8 Plasma RF Power Supply 13.56 MHz / 1000 W 9 Gas Flow Control 0-100 sccm MFC mass flow controller 10 Process Gases 2 channels (O₂, H₂, N₂ and other non-corrosive gases) 11 Process Gas Supply Lines Stainless steel tubing + hoses 12 Chamber Temperature Ambient (room temperature) 13 Working Vacuum Level ≤30 Pa 14 Vacuum Pump Two-stage oil-sealed vane pump, 90 m³/h 15 Pneumatic Gate Valve GDQ-J40 16 Vacuum Measurement System Pirani vacuum gauge (10 ~ 1×10⁻⁵ Pa) 17 Vacuum Exhaust System Connect to external exhaust system 18 Vacuum Break System Solenoid valve + check valve + silencer 19 Evacuation Time (no load) ≤60 s 20 Vacuum Break Time ≤15 s 21 Input Gas Pressure Detection System 2-channel automatic pressure alarm 22 Compressed Air Requirement 0.6-0.8 MPa CDA 23 Main Power Supply 3-phase, 5-wire, 380V, 50Hz 24 Total Power Consumption 5 kW 25 Equipment Weight 500 kg