PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

Model:  TMAX-ZK-JS04- DC Ion Sputtering Coater

Technical Specifications

Key Features & Applications

1. Precision and Flexibility

· Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries.

· Dual locking mechanism prevents sample displacement during operation.

2. High-Quality Coating

· Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications.

3. Automated & User-Friendly Operation

· Programmable controls and auto-venting enhance efficiency and safety.

4. Compact & Low-Noise Design

· Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility.

· Low 56 dB noise level ensures a comfortable working environment.

Ideal Applications

· SEM sample preparation (conductive coating)

· Thin-film deposition for research and industrial applications

· Multi-sample processing (supports 12 SEM stubs)

· Angle-dependent deposition (with optional rotating/tilting stage)

This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.