Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication

Nano Vacuum Magnetron Ion Sputtering Coater For Thin Film Fabrication

Model:  TMAX-ZK-JS05- Compact Ion Sputtering Coater

Overview

The TMAX-ZK-JS05 Compact Ion Sputtering Coater is designed for depositing conductive gold films on samples for scanning electron microscopy (SEM). With user-friendly operation, it is an essential tool for sample preparation in small to medium-sized SEM laboratories.

Key Applications

· Gold ion sputtering for SEM sample coating.

· Compatible with target materials: Au, Pt, Cr, Ag, Ti, Cu, Ni, Au-Pd alloy, etc.

Technical Specifications

Features & Advantages

· Robust Design – Special sealing structure minimizes glass chamber damage.
· High Compatibility – Supports Au, Pt, Cr, Ag, Ti, Cu, Ni, and Au-Pd alloy targets.
· Precision Control – Adjustable gas flow and vacuum protection ensure uniform coatings.
· Efficient Workflow – Dual-stage platform allows batch processing (6 samples at once).

Recommended Applications

✔ SEM Sample Prep – Ideal for non-conductive specimen coating.
✔ Materials Research – Thin-film deposition for nanotechnology studies.
✔ Industrial QC – Reliable performance for repeatable conductive layering.