Lab PVD Ion Sputtering Coater For Metal and Carbon Layer

Lab PVD Ion Sputtering Coater For Metal and Carbon Layer 

Model: TMAX-JY-JS01-SEM Preparation

Overview

The TMAX-JY-JS01 compact magnetron ion sputtering coater is designed for high-quality conductive coating (e.g., gold film) on SEM samples or material surfaces. Featuring stable performance and user-friendly operation, it employs cold magnetron sputtering technology, minimizing heat generation to protect sensitive samples.

Key Features

· Durable Metal Bellows – Corrosion-resistant and aesthetically refined vacuum pump tubing.

· Precision Adjustment – Sensitive micro-valve control with clear scale markings.

· High-Efficiency Vacuum Pump – Fast pumping speed (8 m³/h) with low noise, ideal for lab environments.

· Reliable Circuitry – Stable control board for consistent operation.

· Cold Sputtering – Near-zero temperature rise preserves sample integrity.

Technical Specifications

Applications & Advantages

· SEM Sample Prep: Uniform conductive coatings enhance imaging accuracy.

· Material Science: Versatile metal deposition for thin-film research.

· User-Centric Design: Fast target switching, low maintenance, and lab-friendly noise levels.

Ideal for: Academic labs, quality control, and R&D requiring precision coating with minimal thermal impact.