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Sputter Coater

PVD Thermal Evaporation Carbon Fiber Deposition System Coater For SEM/TEM

  • Model Number:

    TMAX-BY-ZD01
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

PVD Thermal Evaporation Carbon Fiber Deposition System Coater For SEM/TEM

 

Model: TMAX-BY-ZD01-Nanoscale Carbon Coating Machine


1. Product Overview

The TMAX-BY-ZD01 Thermal Evaporation Carbon Coater is a precision instrument designed for depositing ultra-thin carbon films (≤1 nm) onto substrates for high-resolution electron microscopy applications. Utilizing resistive heating of pure carbon fiber strands, it ensures uniform and contamination-free coatings, making it ideal for SEM, TEM, EBSD, and microprobe analysis.

Key Features:

✔ Nanoscale Coating Precision – Deposits carbon films with minimal grain size (<1 nm) for high-resolution imaging.
✔ Dual Carbon Fiber Source (A/B Selectable) – Ensures consistent evaporation and extended filament life.
✔ Vacuum Protection System – Prevents damage from low vacuum conditions.
✔ Fast Deposition (0-1 sec) – Optimized for laboratory efficiency.
✔ Compact & User-Friendly – Sleek design with intuitive controls.


2. Technical Specifications

Core Parameters

Category

Specification

Model

Dimensions (W×D×H)

340mm × 390mm × 300mm

Chamber Material

Borosilicate Glass (Ø170mm × 130mm H)

Evaporation Source

High-Purity Carbon Fiber (Dual Strand A/B Selectable)

Deposition Time

0-1 second (adjustable)

Operating Vacuum

4×10⁻² mbar

Working Voltage

0-30V (AC)

Evaporation Current

0-100A

Vacuum Pump

2-Stage Rotary Pump (Feiyue VRD-8, 8 m³/h @50Hz)

Power Supply

AC 110V/60Hz or 220V/50Hz

Power Consumption

<2000W

Weight

45 kg

Vacuum System Performance

· Base Pressure: ≤2 Pa

· Pumping Speed:

o 50Hz: 8 m³/h (2.2 L/s)

o 60Hz: 9.6 m³/h (2.6 L/s)

· Time to Reach Vacuum: <5 minutes (to 2 Pa)


3. Applications

This is optimized for:

· Scanning Electron Microscopy (SEM) – Reduces charging effects.

· Transmission Electron Microscopy (TEM) – Provides ultra-thin conductive layers.

· EBSD (Electron Backscatter Diffraction) – Enhances signal clarity.

· Microprobe & X-ray Analysis – Ensures minimal interference.


4. Operational Advantages

· High Purity Carbon Films – Minimizes contamination for precise analysis.

· Quick & Repeatable Process – Ideal for high-throughput labs.

· Compact & Low Maintenance – Robust design with minimal upkeep.

 Carbon Deposition System

Nano PVD System