PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation

PVD Magnetron Sputter Coating System For SEM & Wafer Sample Preparation       Model:  TMAX-ZK-JS04- DC Ion Sputtering Coater Technical Specifications Parameter Specification Target Materials Standard: Au (Gold), 57mm diameter × 0.1mm thick  Optional: Pt (Platinum) Standard Sample Holder Holds 12 SEM stubs, height adjustment range: 60mm Rotating/Tilting Stage (Optional) Rotation: 0–60 rpm (continuously adjustable)  Tilt: -90° to +90° (continuously adjustable)  Standard rotating platform: 40mm diameter (holds 4 sample holders, custom sizes available)  Dual locking mechanism for secure fixation Sputtering Current 5–30mA (microprocessor-controlled, programmable) Meters Vacuum: Atm – 1×10⁻³ mbar  Current: 0–99mA Control Method Microprocessor with Start/Pause buttons  Programmable time (1–999s)  Auto-pumping, sputtering, and venting Vacuum System Pumping speed: 133 L/min  Ultimate vacuum: 10⁻⁴ mbar  Noise level: 56 dB Key Features & Applications 1. Precision and Flexibility · Adjustable sputtering current (5–30mA) and rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries. · Dual locking mechanism prevents sample displacement during operation. 2. High-Quality Coating · Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings for SEM and analytical applications. 3. Automated & User-Friendly Operation · Programmable controls and auto-venting enhance efficiency and safety. 4. Compact & Low-Noise Design · Stainless steel chamber (120mm × 75mm) with observation window (120mm × 45mm) provides durability and visibility. · Low 56 dB noise level ensures a comfortable working environment. Ideal Applications · SEM sample preparation (conductive coating) · Thin-film deposition for research and industrial applications · Multi-sample processing (supports 12 SEM stubs) · Angle-dependent deposition (with optional rotating/tilting stage) This sputtering system is optimized for laboratories requiring high precision, automation, and versatile coating capabilities.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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