Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film

Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film        TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin Films Product Overview The TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training. Key Features & Advantages 1. Wide Application Range · Materials Research: Metal films, dielectric layers, polymer coatings. · Functional Devices: Thin-film sensors, optical coatings, nanoelectronics. · Multi-Layer Deposition: Supports up to 99 layers in a single run. 2. User-Friendly Operation · Plug-and-play design—no specialized lab environment required. · 10-inch touchscreen for intuitive control and process monitoring. · Preloaded 100+ deposition recipes for quick setup. 3. High Precision & Stability · Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity). · Turbo-molecular pump (300L/s) achieves ≤6×10⁻⁵ Pa ultimate vacuum. · 3 independent evaporation sources prevent material cross-contamination. 4. Flexible Configuration · Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage. · Automatic & manual modes for customized process control. 5. Low Maintenance & Compact Design · Aluminum chamber for efficient heat dissipation. · 65 kg weight, suitable for benchtop use in labs or offices. Technical Specifications Parameter Specification Chamber Ø300 × 350(h) mm (quartz glass) Vacuum System 300L/s turbomolecular pump + dual-stage rotary pump Ultimate Vacuum ≤6 × 10⁻⁵ Pa (after baking) Leak Rate ≤5.0 × 10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) Film Uniformity ≤3% (with rotation) Evaporation Sources 3 independent thermal sources Max Layers per Run 99 layers (up to 4 materials) Control Interface 10" touchscreen with programmable recipes Power Supply AC 230V, 32A, 50Hz Cooling Water (Optional) 0.2 MPa, 15–25°C, ≥8 L/min Operational Workflow 1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation. 2. Multi-Layer Control: Supports time-based or thickness-based deposition modes. 3. Remote Monitoring: Adjust parameters via network connection. Why Choose? ✔ Combines research-grade performance with desktop convenience. ✔ Minimal training required—ideal for multi-user environments. ✔ Scalable for both experimental and small production needs.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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