Glovebox Multi-Material Evaporator Machine For Atomic Layer Deposition & Perovskite

 Glovebox Multi-Material Evaporator Machine For Atomic Layer Deposition & Perovskite        TMAX-ZY-DZ01-Advanced Thin-Film Deposition System Overview The TMAX-ZY-DZ01 Electron Beam Evaporation Coating System integrates a cryogenic pump vacuum assembly to deposit thin films via electron beam bombardment in a high-vacuum environment. Equipped with 6 electron beam evaporation sources, 2 resistive thermal evaporation sources, and a precision deposition control system, it enables rapid multilayer metal/alloy film deposition. Ideal for semiconductor fabrication, advanced research, and new material development. Key Applications ✔ Scientific Research – High-precision thin-film deposition for experimental studies. ✔ Semiconductor Wafer Processing – Uniform coatings for microelectronics and MEMS devices. ✔ Optical Thin-Film Components – Low-defect films for lenses, filters, and laser optics. ✔ Nano/Microelectronic Devices – Ultra-thin, controlled-thickness coatings for advanced electronics. System Advantages & Features 1. High Flexibility & Customization · Modular design allows tailored configurations (e.g., additional evaporation sources). · Dual evaporation modes (E-beam + resistive thermal) support diverse materials (metals, alloys, organics). 2. Superior Vacuum Performance · Cryo-Torr 8 (1500L/s) + dry scroll pump achieves <5×10⁻⁶ Pa base pressure (≤35 min pumping time). · VAT ISO-F200 high-vacuum valve ensures pressure stability and cryopump isolation. 3. Precision Deposition Control · INFICON IC6 quartz crystal monitor (0.01 Å/s resolution) with dual water-cooled sensors. · Planetary substrate rotation (0–30 RPM) ensures ≤2% thickness uniformity. · 3 IR heaters (RT–300°C ±0.5°C) and PID-controlled cooling for thermal management. 4. Efficiency & Automation · 3 independent substrate holders (max. 250 mm × 3) enable batch processing. · PC+PLC+FTM control software supports 99-layer programmable recipes, real-time editing, and data export. 5. Reliability & Safety · Telemark E-beam sources (6×7 cc crucibles, 10 kV/800 mA) ensure stable, contamination-free deposition. · Multi-interlock protection (cooling/pressure/power failure/leak detection). Technical Specifications Category Parameter Vacuum System Base pressure: ≤6×10⁻⁸ Torr; Leak rate ≤5×10⁻⁹ Pa·L/s Deposition Rate ≥10 nm/min (material-dependent) E-Beam Sources 6×7 cc crucibles; 10 kV, 800 mA (Telemark 244-9906-1) Resistive Sources 2×100 mm boats; 6–10 V, 400 A (water-cooled) Max. Coating Layers 99 Substrate Capacity 3×250 mm (rotating planetary holders) Chamber Dimensions Φ600 mm × 690 mm (h); detachable liner Cooling System 3 water circuits (8 L/min, 15–25°C) Power Requirements AC 230 V, 32 A, 50 Hz Dimensions/Weight 1750×1150×2000 mm (H); 650 kg Environmental & Operational Requirements · Temperature: 23±3°C · Humidity: <60% RH · Cooling Water: 0.2 MPa, ≥8 L/min · Compressed Gas: 0.5 MPa, 80 L/min (if applicable) Why Choose? · Research-Grade Precision: Combines high vacuum stability with sub-nanometer thickness control. · Multi-Material Compatibility: Handles metals (Al, Au, Ti), oxides, and organic compounds. · Scalability: Suitable for R&D prototyping and small-batch production. · User-Centric Design: Automated workflows reduce manual intervention while allowing parameter flexibility. Ideal for: Universities, semiconductor labs, and optoelectronics manufacturers seeking repeatable, high-quality thin films with minimal downtime.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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