Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications

Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications     TMAX-PD-ZD02-Multi-Material Coater for Au, Ag, Al, Perovskite Films Product Overview The TMAX-PD-ZD02 High-Vacuum Evaporation Coating System is designed for depositing high-quality metal, organic, and functional thin films, with broad applications in academic research (materials science, physics, chemistry, electronics, energy) and industrial R&D (OPV perovskite solar cells, semiconductors, OLED displays). It supports 4–6 evaporation sources (compatible with wire and boat configurations) and features a versatile design for both metal and organic material deposition (organic evaporation uses tungsten baskets/crucibles). Key Features 1. Precision & Stability ·Advanced evaporation power supply with constant current/power control, ensuring high process repeatability (±3%–5% uniformity). ·Programmable automation: One-touch start/stop and pre-set current/power parameters. 2. User-Friendly Operation ·PLC + touchscreen interface for intuitive control and high automation. ·Front-loading chamber (304 stainless steel, Ø260×H310 mm) with observation window for easy sample handling and maintenance. 3. Flexible Substrate & Source Options ·Adjustable substrate stage: Heated (0–300°C, ±1°C) or water-cooled, with rotational capability (0–30 RPM) and vertical adjustment (280–380 mm source-to-substrate distance). ·Multi-source compatibility: 4–6 sources for co-evaporation or sequential deposition, with anti-cross-contamination partitions. 4. High-Vacuum Performance ·Vacuum level: ≤5×10−5 Pa (base pressure);  ·leak rate ≤5×10−8 Pa·m3s. ·Fast pumping: Achieves 5×10−4 Pa in <30 min (1200 L/s molecular pump + rotary vane pump). 5. Versatile Applications ·Deposits metals (Au, Ag, Al, Cu, etc.), compounds (MoO3, LiF), and organic materials. 6. Ideal for multilayer films, electrodes, and SEM sample preparation. Technical Specifications Parameter Detail Chamber Dimensions 350×350×450 mm (L×W×H) System Footprint 750×1100×1900 mm Max. Substrate Size 120×120 mm Evaporation Sources 4–6 groups (metal/organic) Film Uniformity ±3%–±5% Pumping System Molecular pump + 6 L/s rotary pump Optional Accessories INFICON SQC310 thickness monitor, precision etching mask Why Choose this? · Compact & Safe: Closed-frame design (0.7 m² footprint) with wheels for mobility. · High Throughput: Processes up to 25 ITO/FTO glass slides (15–25 mm) per batch. · Research-Grade: Supports OPV, OLED, and semiconductor R&D with industry-leading repeatability. 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