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Sputter Coater for SEM Sample Preparation

Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications

  • Model Number:

    TMAX-PD-ZD02
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications

 

 

TMAX-PD-ZD02-Multi-Material Coater for Au, Ag, Al, Perovskite Films


Product Overview

The TMAX-PD-ZD02 High-Vacuum Evaporation Coating System is designed for depositing high-quality metal, organic, and functional thin films, with broad applications in academic research (materials science, physics, chemistry, electronics, energy) and industrial R&D (OPV perovskite solar cells, semiconductors, OLED displays). It supports 4–6 evaporation sources (compatible with wire and boat configurations) and features a versatile design for both metal and organic material deposition (organic evaporation uses tungsten baskets/crucibles).


Key Features

1. Precision & Stability

·Advanced evaporation power supply with constant current/power control, ensuring high process repeatability (±3%–5% uniformity).

·Programmable automation: One-touch start/stop and pre-set current/power parameters.

2. User-Friendly Operation

·PLC + touchscreen interface for intuitive control and high automation.

·Front-loading chamber (304 stainless steel, Ø260×H310 mm) with observation window for easy sample handling and maintenance.

3. Flexible Substrate & Source Options

·Adjustable substrate stage: Heated (0–300°C, ±1°C) or water-cooled, with rotational capability (0–30 RPM) and vertical adjustment (280–380 mm source-to-substrate distance).

·Multi-source compatibility: 4–6 sources for co-evaporation or sequential deposition, with anti-cross-contamination partitions.

4. High-Vacuum Performance

·Vacuum level: ≤5×10−5 Pa (base pressure); 

·leak rate ≤5×10−8 Pa·m3s.

·Fast pumping: Achieves 5×10−4 Pa in <30 min (1200 L/s molecular pump + rotary vane pump).

5. Versatile Applications

·Deposits metals (Au, Ag, Al, Cu, etc.)compounds (MoO3, LiF), and organic materials.

6. Ideal for multilayer filmselectrodes, and SEM sample preparation.


Technical Specifications

Parameter

Detail

Chamber Dimensions

350×350×450 mm (L×W×H)

System Footprint

750×1100×1900 mm

Max. Substrate Size

120×120 mm

Evaporation Sources

4–6 groups (metal/organic)

Film Uniformity

±3%–±5%

Pumping System

Molecular pump + 6 L/s rotary pump

Optional Accessories

INFICON SQC310 thickness monitor, precision etching mask


Why Choose this?

· Compact & Safe: Closed-frame design (0.7 m<sup>2</sup> footprint) with wheels for mobility.

· High Throughput: Processes up to 25 ITO/FTO glass slides (15–25 mm) per batch.

· Research-Grade: Supports OPV, OLED, and semiconductor R&D with industry-leading repeatability.

Ideal for: Universities, labs, and industries focused on advanced thin-film technologies.

 Physical Vapor Deposition Equipment