Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment

Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment      Model: TMAX-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater 1. Product Overview Introduction The TMAX-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality. Key Technologies & Advantages ✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating. ✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment. ✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating. ✔ Vacuum Protection System – Safeguards against low-vacuum short circuits. ✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min). 2. Technical Specifications Core Parameters Category Specification Model TMAX-BY-ZD02 Dimensions (W×D×H) 390mm × 310mm × 290mm Chamber Material Borosilicate Glass (Ø160mm × 110mm H) Sample Stage 50mm (Diameter) Evaporation Source High-Purity Carbon Rope Deposition Modes Flash / Pulsed (0-9 pulses programmable) Max Evaporation Current 80A Operating Vacuum 4–6 Pa Ultimate Vacuum 5 Pa Pump Type 2-Stage Rotary Pump (VRD-8, 8 m³/h @50Hz) Power Supply 220V AC, 50Hz Power Consumption 1.6 kW Weight ~50 kg Vacuum System Performance · Pumping Speed: o 50Hz: 8 m³/h (2.2 L/s) o 60Hz: 9.6 m³/h (2.6 L/s) · Time to Reach Vacuum: <5 minutes (to 2 Pa) · Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar 3. Applications · High-Resolution SEM/TEM – Minimizes charging effects. · EBSD Analysis – Enhances electron backscatter diffraction signals. · X-ray Microanalysis – Provides conductive layers with minimal interference. 4. Operational Highlights Pulsed Evaporation Technology · Reduces Debris: Short pulses limit carbon splashing for cleaner coatings. · Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition. User-Centric Design · Touchscreen Interface: Intuitive control for current/pulse adjustment. · No Process Gas Required: Simplified operation compared to sputtering systems.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film

Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film        TMAX-BY-ZD05| Ion Sputtering & Evaporation Coater for SEM Specification Integrated with sputtering and thermal evaporation functions, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters. Technical Specifications Parameter Value Dimensions 305 mm × 400 mm × 390 mm (W×D×H) Vacuum Chamber Material Borosilicate glass, 160 mm × 110 mm (D×H) Target (Upper Electrode) 50 mm × 0.1 mm (D×H) Sputtering Targets Au (standard), optional Ag, Pt, etc. Target Size φ50 mm Sample Stage Compatible with 50 mm/70 mm diameter; customizable Sputtering Voltage 0–1600 V (DC), adjustable Sputtering Current 0–50 mA Sputtering Timer 0–360 s Carbon Evaporation Current 0–100 A (AC) Evaporation Material Carbon fiber Evaporation Voltage 0–30 V Evaporation Time 0–1 s Gas Inlet Valve Compatible with φ3 mm tubing Process Gases Multiple options Power Supply 220 V (110 V optional), 50 Hz Vacuum Pump 2L rotary vane pump (VRD-8, domestic) Key Features 1. Dual-Function Design ·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications. ·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm). 2. Precision Control ·Adjustable sputtering current, vacuum pressure, and gas selection to optimize coating rate and particle size. ·Digital timer for reproducible processes. 3. Enhanced Sample Protection ·Conductive coatings eliminate charging effects in non-conductive samples. ·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage. 4. Efficiency & Reliability ·Compact footprint with automated vacuum protection to prevent short circuits. ·Uniform film deposition with short processing time. Applications · Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage. · Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging. · Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites.             html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; 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Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications

Film Deposition Equipment For Metal And Perovskite Films In  Solar, OLED & Semiconductor Applications     TMAX-PD-ZD02-Multi-Material Coater for Au, Ag, Al, Perovskite Films Product Overview The TMAX-PD-ZD02 High-Vacuum Evaporation Coating System is designed for depositing high-quality metal, organic, and functional thin films, with broad applications in academic research (materials science, physics, chemistry, electronics, energy) and industrial R&D (OPV perovskite solar cells, semiconductors, OLED displays). It supports 4–6 evaporation sources (compatible with wire and boat configurations) and features a versatile design for both metal and organic material deposition (organic evaporation uses tungsten baskets/crucibles). Key Features 1. Precision & Stability ·Advanced evaporation power supply with constant current/power control, ensuring high process repeatability (±3%–5% uniformity). ·Programmable automation: One-touch start/stop and pre-set current/power parameters. 2. User-Friendly Operation ·PLC + touchscreen interface for intuitive control and high automation. ·Front-loading chamber (304 stainless steel, Ø260×H310 mm) with observation window for easy sample handling and maintenance. 3. Flexible Substrate & Source Options ·Adjustable substrate stage: Heated (0–300°C, ±1°C) or water-cooled, with rotational capability (0–30 RPM) and vertical adjustment (280–380 mm source-to-substrate distance). ·Multi-source compatibility: 4–6 sources for co-evaporation or sequential deposition, with anti-cross-contamination partitions. 4. High-Vacuum Performance ·Vacuum level: ≤5×10−5 Pa (base pressure);  ·leak rate ≤5×10−8 Pa·m3s. ·Fast pumping: Achieves 5×10−4 Pa in <30 min (1200 L/s molecular pump + rotary vane pump). 5. Versatile Applications ·Deposits metals (Au, Ag, Al, Cu, etc.), compounds (MoO3, LiF), and organic materials. 6. Ideal for multilayer films, electrodes, and SEM sample preparation. Technical Specifications Parameter Detail Chamber Dimensions 350×350×450 mm (L×W×H) System Footprint 750×1100×1900 mm Max. Substrate Size 120×120 mm Evaporation Sources 4–6 groups (metal/organic) Film Uniformity ±3%–±5% Pumping System Molecular pump + 6 L/s rotary pump Optional Accessories INFICON SQC310 thickness monitor, precision etching mask Why Choose this? · Compact & Safe: Closed-frame design (0.7 m² footprint) with wheels for mobility. · High Throughput: Processes up to 25 ITO/FTO glass slides (15–25 mm) per batch. · Research-Grade: Supports OPV, OLED, and semiconductor R&D with industry-leading repeatability. Ideal for: Universities, labs, and industries focused on advanced thin-film technologies.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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