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Sputter Coater for SEM Sample Preparation

Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition

  • Model Number:

    TMAX-PC-DZ04
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition 

 

 

TMAX-PC-DZ04-Electron Beam Evaporation Coating System


Applications

· Deposition of conductive, semiconductor, ferroelectric, and optical films

· Ideal for research labs, universities, and small-scale production

Key Advantages

✔ High-precision deposition with E-type electron gun for uniform coatings
✔ Dual evaporation modes (E-beam + optional resistive thermal evaporation)
✔ Rotating & heated substrate stage (up to 800°C) for improved film adhesion
✔ Fast vacuum recovery (<20 min to high vacuum) for efficient operation
✔ Quartz crystal monitoring for real-time thickness control (0–999.99 nm)
✔ Flexible configuration (4-pocket crucible, multi-material compatibility)


Technical Specifications

Category

Parameter

Value/Description

Vacuum System

Ultimate Vacuum

≤6.7×10-4Pa

 

Vacuum Recovery Time (1×10-1→5×10-4)

≤20 min

 

Leak Rate

≤6.7×10-7 Pa·L/s

Vacuum Chamber

Dimensions

500 × 500 × 600 mm (U-shaped, front-opening)

E-Gun Evaporation

Anode Voltage

6 kV / 8 kV (1 set)

 

Crucible

Water-cooled, 4-pocket (11 mL each)

 

Power Range

0–6 kW (adjustable)

Resistive Evaporation (Optional)

Voltage

5 V / 10 V

 

Max Current/Power

300 A / 3 kW (1 set)

 

Electrodes

3 water-cooled (configurable for 2 boats)

Substrate Handling

Max Substrate Size

4″ (100 mm)

 

Rotation Speed

5–60 RPM

 

Source-to-Substrate Distance

300–350 mm

 

Heating Temperature

Up to 800°C (±1°C)

Control & Monitoring

Shutter

Manual (1 set)

 

Gas Flow Control

1-channel MFC

 

Thickness Monitor (QCM)

0–99,999 Å (0–999.99 nm)


Recommended Use Cases

· Semiconductor research (dielectric layers, conductive films)

· Optical coatings (anti-reflective, filters, mirrors)

· Advanced materials (ferroelectrics, superconductors, 2D materials)

· Prototype development for thin-film devices

Why Choose this?

· Reliable performance for high-purity film growth.

· Modular design supports diverse materials and processes.

· User-friendly controls for both manual and precision deposition.

 

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