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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition
Model Number:
TMAX-PC-DZ04Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System
Benchtop PVD Systems Manufacturer For Metal, Oxide, Semiconductor Deposition
TMAX-PC-DZ04-Electron Beam Evaporation Coating System
Applications
· Deposition of conductive, semiconductor, ferroelectric, and optical films
· Ideal for research labs, universities, and small-scale production
Key Advantages
✔ High-precision deposition with E-type electron gun for uniform coatings
✔ Dual evaporation modes (E-beam + optional resistive thermal evaporation)
✔ Rotating & heated substrate stage (up to 800°C) for improved film adhesion
✔ Fast vacuum recovery (<20 min to high vacuum) for efficient operation
✔ Quartz crystal monitoring for real-time thickness control (0–999.99 nm)
✔ Flexible configuration (4-pocket crucible, multi-material compatibility)
Technical Specifications
Category |
Parameter |
Value/Description |
Vacuum System |
Ultimate Vacuum |
≤6.7×10-4Pa |
|
Vacuum Recovery Time (1×10-1→5×10-4) |
≤20 min |
|
Leak Rate |
≤6.7×10-7 Pa·L/s |
Vacuum Chamber |
Dimensions |
500 × 500 × 600 mm (U-shaped, front-opening) |
E-Gun Evaporation |
Anode Voltage |
6 kV / 8 kV (1 set) |
|
Crucible |
Water-cooled, 4-pocket (11 mL each) |
|
Power Range |
0–6 kW (adjustable) |
Resistive Evaporation (Optional) |
Voltage |
5 V / 10 V |
|
Max Current/Power |
300 A / 3 kW (1 set) |
|
Electrodes |
3 water-cooled (configurable for 2 boats) |
Substrate Handling |
Max Substrate Size |
4″ (100 mm) |
|
Rotation Speed |
5–60 RPM |
|
Source-to-Substrate Distance |
300–350 mm |
|
Heating Temperature |
Up to 800°C (±1°C) |
Control & Monitoring |
Shutter |
Manual (1 set) |
|
Gas Flow Control |
1-channel MFC |
|
Thickness Monitor (QCM) |
0–99,999 Å (0–999.99 nm) |
Recommended Use Cases
· Semiconductor research (dielectric layers, conductive films)
· Optical coatings (anti-reflective, filters, mirrors)
· Advanced materials (ferroelectrics, superconductors, 2D materials)
· Prototype development for thin-film devices
Why Choose this?
· Reliable performance for high-purity film growth.
· Modular design supports diverse materials and processes.
· User-friendly controls for both manual and precision deposition.




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+86 13174506016
David@tmaxcn.com