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Sputter Coater for SEM Sample Preparation

Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System

  • Model Number:

    TMAX-QH-DZ01
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System 

 

TMAX-QH-DZ01-Electron Beam Evaporation Coating System


1. Core Parameters

No.

Parameter

Specification

1

Ultimate Vacuum

≤6×10−5 Pa (after baking, new equipment)

2

Leak Rate

≤6.7×10−8 Pa·L/S

3

Working Vacuum

7×10−4 Pa (reached in <40 min)

4

System Pressure Holding

≤10 Pa after 12 hours (post shutdown)

5

Sample Size

100×100 mm

6

Sample Holder Size

126×126 mm (includes 2 sets)

7

Evaporation Distance

330±20 mm

8

Sample Stage

0–30 RPM rotation; Heating: 300°C (±1°C)

9

Electron Gun

6 kW, 270° deflection, 4-pocket water-cooled crucible

10

Resistive Evaporation

Dual-position switching

11

Thickness Probes

2 sets (quartz crystal)

12

Chamber Access

Manual front-opening design

13

Control Mode

Power-regulated deposition

14

Film Uniformity

≤±3% (9-point test on 10×10 cm2)

15

Pumping System

Automated vacuum control


2. Key Advantages

·Ultra-High Vacuum Performance

o Achieves ≤6×10−5 Pa after baking, ideal for contamination-sensitive applications.

Low leak rate (6.7×10−8 Pa·L/S) ensures long-term stability.

·Precision Deposition Control

±1°C heating accuracy (sample stage) minimizes thermal stress on films.

±3% thickness uniformity across 9 test points for reproducible coatings.

·Efficiency & Automation

<40 min pump-down time (ambient to working vacuum) reduces idle periods.

Automated pumping/control lowers operator dependency and human error

·Versatile Evaporation Options

6 kW e-gun handles refractory materials (e.g., oxides, carbides).

Dual-position resistive evaporation for sequential metal/alloy deposition.

·User-Friendly Design

Front-opening chamber simplifies sample loading/cleaning.

2 thickness probes enable real-time monitoring and correction.


3. Recommended Applications

· Optics & Photonics

o Anti-reflection coatings, laser mirrors, optical filters.

· Semiconductor & Electronics

o Thin-film transistors, conductive layers, MEMS devices.

· R&D & Academia

o Material science studies, nanostructured films, solar cell research.

· Industrial Coatings

o Wear-resistant layers, decorative films, barrier coatings.


4. Customization Options (Optional)

· Larger sample holders (up to 200×200 mm).

· Additional probes or substrate heating configurations.

· Integration with in-situ monitoring tools (e.g., ellipsometry)

 Perovskite Deposition System