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Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System
Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System TMAX-QH-DZ01-Electron Beam Evaporation Coating System 1. Core Parameters No. Parameter Specification 1 Ultimate Vacuum ≤6×10−5 Pa (after baking, new equipment) 2 Leak Rate ≤6.7×10−8 Pa·L/S 3 Working Vacuum 7×10−4 Pa (reached in <40 min) 4 System Pressure Holding ≤10 Pa after 12 hours (post shutdown) 5 Sample Size 100×100 mm 6 Sample Holder Size 126×126 mm (includes 2 sets) 7 Evaporation Distance 330±20 mm 8 Sample Stage 0–30 RPM rotation; Heating: 300°C (±1°C) 9 Electron Gun 6 kW, 270° deflection, 4-pocket water-cooled crucible 10 Resistive Evaporation Dual-position switching 11 Thickness Probes 2 sets (quartz crystal) 12 Chamber Access Manual front-opening design 13 Control Mode Power-regulated deposition 14 Film Uniformity ≤±3% (9-point test on 10×10 cm2) 15 Pumping System Automated vacuum control 2. Key Advantages ·Ultra-High Vacuum Performance o Achieves ≤6×10−5 Pa after baking, ideal for contamination-sensitive applications. o Low leak rate (6.7×10−8 Pa·L/S) ensures long-term stability. ·Precision Deposition Control o ±1°C heating accuracy (sample stage) minimizes thermal stress on films. o ±3% thickness uniformity across 9 test points for reproducible coatings. ·Efficiency & Automation o <40 min pump-down time (ambient to working vacuum) reduces idle periods. o Automated pumping/control lowers operator dependency and human error ·Versatile Evaporation Options o 6 kW e-gun handles refractory materials (e.g., oxides, carbides). o Dual-position resistive evaporation for sequential metal/alloy deposition. ·User-Friendly Design o Front-opening chamber simplifies sample loading/cleaning. o 2 thickness probes enable real-time monitoring and correction. 3. Recommended Applications · Optics & Photonics o Anti-reflection coatings, laser mirrors, optical filters. · Semiconductor & Electronics o Thin-film transistors, conductive layers, MEMS devices. · R&D & Academia o Material science studies, nanostructured films, solar cell research. · Industrial Coatings o Wear-resistant layers, decorative films, barrier coatings. 4. Customization Options (Optional) · Larger sample holders (up to 200×200 mm). · Additional probes or substrate heating configurations. · Integration with in-situ monitoring tools (e.g., ellipsometry) html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition
Solar Cell Thin Film Evaporation Evaporator For Metals, Alloys & Dielectric Deposition TMAX-PC-DZ03-Electron Beam Evaporation Coating System Key Applications Designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, this system is widely utilized in university laboratories, research institutions, and small-scale production environments requiring high-precision thin-film fabrication. System Components · Deposition Chamber: U-shaped design with front-loading door, dimensions: 800 × 600 × 600 mm. · E-Gun Electron Beam Source: o Anode voltage: 8 kV / 10 kV (1 set included). o Power range: 0–10 kW (adjustable). · Crucible: Water-cooled, 6-pocket design (11 mL per pocket). · Resistive Evaporation Source (Optional): o Voltage: 5 V / 10 V. o Power: 300 A current, max. 3 kW output (1 set). o Configurable with 3 water-cooled electrodes to form 2 evaporation boats. · Substrate Holder: o Accommodates up to 4″ substrates. o Rotational speed: 5–60 RPM (continuously adjustable). o Substrate-to-source distance: 300–350 mm. o Heating range: up to 800°C ±1°C (manual control). o Includes a manual sample shutter assembly. · Gas Delivery System: 1-channel mass flow controller (MFC). · Vacuum System: o Base pressure: ≤6.7 × 10–4 Pa. o Pump-down time: ≤20 min (from 1 × 10–1 Pa to 5 × 10–4 Pa). o Leak rate: ≤6.7 × 10–7 Pa·L/s. · Thickness Monitoring: Quartz crystal microbalance (QCM) with display range: 0–99,999 Å. Technical Advantages 1. Precision Control: Adjustable e-beam power and substrate rotation ensure uniform film thickness and composition. 2. Versatility: Compatible with multiple evaporation sources (e-beam + resistive), enabling deposition of diverse materials. 3. High-Temperature Stability: Substrate heating up to 800°C (±1°C) supports annealing and epitaxial growth. 4. Efficient Vacuum Performance: Rapid pump-down and low leak rate enhance process reproducibility. 5. User-Friendly Design: Front-loading chamber and modular components simplify maintenance and sample handling. Target Industries & Research Fields · Advanced Materials: Optoelectronics, MEMS, superconducting films. · Energy Applications: Thin-film solar cells, battery electrodes. · Academic Research: Surface science, nanotechnology, and condensed matter physics. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; 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