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- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System
Perovskite Vacuum Multilayer Organic Thin Film Evaporation Deposition System TMAX-QH-DZ01-Electron Beam Evaporation Coating System 1. Core Parameters No. Parameter Specification 1 Ultimate Vacuum ≤6×10−5 Pa (after baking, new equipment) 2 Leak Rate ≤6.7×10−8 Pa·L/S 3 Working Vacuum 7×10−4 Pa (reached in <40 min) 4 System Pressure Holding ≤10 Pa after 12 hours (post shutdown) 5 Sample Size 100×100 mm 6 Sample Holder Size 126×126 mm (includes 2 sets) 7 Evaporation Distance 330±20 mm 8 Sample Stage 0–30 RPM rotation; Heating: 300°C (±1°C) 9 Electron Gun 6 kW, 270° deflection, 4-pocket water-cooled crucible 10 Resistive Evaporation Dual-position switching 11 Thickness Probes 2 sets (quartz crystal) 12 Chamber Access Manual front-opening design 13 Control Mode Power-regulated deposition 14 Film Uniformity ≤±3% (9-point test on 10×10 cm2) 15 Pumping System Automated vacuum control 2. Key Advantages ·Ultra-High Vacuum Performance o Achieves ≤6×10−5 Pa after baking, ideal for contamination-sensitive applications. o Low leak rate (6.7×10−8 Pa·L/S) ensures long-term stability. ·Precision Deposition Control o ±1°C heating accuracy (sample stage) minimizes thermal stress on films. o ±3% thickness uniformity across 9 test points for reproducible coatings. ·Efficiency & Automation o <40 min pump-down time (ambient to working vacuum) reduces idle periods. o Automated pumping/control lowers operator dependency and human error ·Versatile Evaporation Options o 6 kW e-gun handles refractory materials (e.g., oxides, carbides). o Dual-position resistive evaporation for sequential metal/alloy deposition. ·User-Friendly Design o Front-opening chamber simplifies sample loading/cleaning. o 2 thickness probes enable real-time monitoring and correction. 3. Recommended Applications · Optics & Photonics o Anti-reflection coatings, laser mirrors, optical filters. · Semiconductor & Electronics o Thin-film transistors, conductive layers, MEMS devices. · R&D & Academia o Material science studies, nanostructured films, solar cell research. · Industrial Coatings o Wear-resistant layers, decorative films, barrier coatings. 4. Customization Options (Optional) · Larger sample holders (up to 200×200 mm). · Additional probes or substrate heating configurations. · Integration with in-situ monitoring tools (e.g., ellipsometry) html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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