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  • Vacuum Thermal Evaporating Sputtering Coater Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump

    Vacuum Pulsing Thermal Evaporating Sputtering Coating Coater with Vacuum Pump   Introduction Automatic Pulsing Thermal Evaporation Carbon Coater (SD980 Model) that is ideal and designed for lab SEM sample preparation. SD980 Model carbon coater is a fully-automated carbon coater that applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM. A pulsed mode for protecting samples is also included. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It is user friendly and easy to operate by Controlling Touch Screen Heating Power (Current) and Pulsing Times (Recipe). Vacuum pump is included. Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2 Pa Max evaporation current 80A Working pressure 6 Pa - 4 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Chamber size Φ150*120mm (height) scratch resistant quartz glass Evaporation target source Target material :carbon rope/target source: carbon rope Operation method Instruction Manual Weight/size 45kg/390mm length x 310mm wide x 290mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <2000W Warranty One year limited warranty with lifetime product support

  • Sputter Coater for SEM Sample Preparation High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine

    High-Precision PVD Magnetron Sputtering & Thermal Evaporation Carbon Coating Machine     Dual-function SEM Sample Preparation Instrument 1. Technical Specifications Vacuum System Parameter Specification Rotary Pumping Speed 50 Hz: 8 m³/h (2.2 L/s) / 60 Hz: 9.6 m³/h (2.6 L/s) Vacuum Limit 2 Pa Max Sputtering Current 100 mA Max Evaporation Current 100 A Sputtering Working Pressure 20 Pa – 8 Pa Evaporation Working Pressure 6 Pa – 4 Pa Working Vacuuming Time < 5 min (to 2 Pa) Vacuum Measurement Atmosphere to 2×10 mbar Gas Control Gas Flow Controller Chamber Size Ø150 × 120 mm (height), scratch-resistant quartz glass Magnetron Target Source Ø50 × 0.1 mm (Au) / Optional: Au, Ag, Pt Evaporation Target Source Carbon Rope Operation Method Manual (instruction manual included) Dimensions (Main Unit) 360 mm (L) × 300 mm (W) × 380 mm (H) Dimensions (Evaporation Unit) 360 mm (L) × 300 mm (W) × 160 mm (H) Weight 55 kg Power Supply AC 110V 60Hz or AC 220V 50Hz Power Consumption < 2000 W Cooling Method Air Cooling (Evaporation) + Water Cooling (Sputtering) Warranty 1-year limited warranty with lifetime product support Sputtering Parameters · Sputtering Targets: Au (standard), optional Ag, Pt, Cr, Al, Cu · Target Size: Ø50 mm · Sample Stage: Adjustable height, accommodates Ø50 mm and Ø70 mm samples (customizable) · Sputtering Voltage: 0–1600 V (DC, adjustable) · Sputtering Current: 0–50 mA · Sputtering Time: 0–360 s Evaporation Parameters · Evaporation Material: Carbon fiber rope · Evaporation Current: 0–100 A (AC) · Evaporation Voltage: 0–30 V · Evaporation Time: 0–1 s · Micro Vacuum Valve: Compatible with Ø3 mm tubing General · Input Voltage: 220 V (110 V optional), 50 Hz · Vacuum Pump: 2 L/s rotary vane pump (domestic VRD-8) 2. Key Features Dual-Function Advantages · Integrated Design: Combines metal sputtering and carbon evaporation in one compact system · Process Flexibility: Switch between conductive metal coatings (Au/Ag/Pt) and ultra-thin carbon films · Time Efficiency: 5-minute pump-down enables rapid sample processing User-Centric Design · Transparent chamber for real-time monitoring · Ergonomic controls with preset programs · Tool-free target replacement system html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; 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