Solid State Battery Multilayer PVD System For Composite Film Fabrication Deposition

Solid State Battery Multilayer PVD System For Composite Film Fabrication Deposition      TMAX-PC-DZ01 Electron Beam Evaporation Coating System Primary Applications The TMAX-PC-DZ01 is designed for the deposition of conductive films, semiconductor films, ferroelectric films, and optical coatings, making it ideal for research institutions, universities, and small-batch production. Its high precision and versatility allow for advanced material studies and thin-film applications in optoelectronics, microelectronics, and nanotechnology. System Composition The system consists of: · Evaporation Chamber: U-shaped design (500×600×500 mm) with front-loading access and rear-mounted pumping system. · E-Gun (Electron Beam Evaporator): High-power electron gun for uniform and high-purity film deposition. · Thermal Evaporation Electrodes: Supports alternative resistive evaporation (optional). · Rotating Substrate Heater: Ensures uniform coating with adjustable rotation (5-60 rpm). · Gas Supply System: Equipped with mass flow controllers for reactive or inert gas deposition. · Vacuum System: High-efficiency pumping system for rapid evacuation. · Control System: Automated and manual controls for precise operation. Key Technical Specifications Parameter Specification Ultimate Vacuum ≤6.7×10⁻⁴ Pa Pump-Down Time (1×10⁵ Pa → 5×10⁻³ Pa) ≤20 min Leak Rate ≤6.7×10⁻⁷ Pa·L/s Chamber Dimensions 500×600×500 mm (U-shaped, front-opening) E-Gun Specifications   - Anode Voltage 8 kV (1 set) - Crucible Water-cooled, 4 pockets (11 ml each) - Power Range 0–8 kW (adjustable) Resistive Evaporation (Optional)   - Voltage 5 V - Max. Current 300 A - Power 2 kW (1 set, switchable) - Water-Cooled Electrodes 3 rods (forming 2 evaporation boats) Substrate Specifications   - Max. Substrate Size 4 inches - Rotation Speed 5–60 rpm - Source-Substrate Distance 300–350 mm - Heating Temperature Up to 600°C (±1°C, adjustable) - Manual Shutter 1 set Gas Control System 1-channel mass flow controller Quartz Crystal Monitor Thickness display range: 0–99,999 Å Advantages & Features ✔ High Film Uniformity: Rotating substrate holder ensures even deposition. ✔ Precise Thickness Control: Quartz crystal monitor allows real-time monitoring (0–99,999 Å). ✔ Multi-Material Deposition: Supports e-beam evaporation (metals, oxides) and resistive evaporation (low-melting-point materials). ✔ High-Temperature Stability: Substrate heating up to 600°C (±1°C) for improved film adhesion and crystallinity. ✔ Efficient Vacuum System: Fast pump-down and ultra-low leak rate for high-purity deposition. Ideal for · Academic Research: Thin-film studies in physics, materials science, and engineering. · Semiconductor & Optoelectronic R&D: Fabrication of sensors, solar cells, and optical coatings. · Small-Scale Production: Prototyping and specialized coating applications. This system is a cost-effective, high-performance solution for laboratories requiring reliable, repeatable thin-film deposition.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }