Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm

Lab DC Vacuum Ion Sputtering Coating Coater with Chamber Size of 150*120mm   Introduction Ion Sputtering Coater (SD900 Model)  is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly within 2 minutes when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate. Vacuum pump is included.   Parameter Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuum limit 2Pa Max sputtering current 0-20mA Working pressure 30Pa -7 Pa Vacuuming time <5 Min(2 Pa) Vacuum measure Measuring range from atmosphere to 2*10-2mbar Gas control Gas flow controller Chamber size Φ150*120mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/ target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 45kg/360mm length x 300mm wide x 380mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support 

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation

DC Vacuum Portable Auto Ion Sputtering Coater for Non-conductive SEM Sample Preparation Introduction   Compact Automatic Ion Sputtering Coater (SD800 Model) that is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive SEM samples with Au for better imaging. It is also excellent for surface treatment. Working vacuum pressure can be achieved quickly when using proper vacuum pump. It generates much less heat. It is user friendly and easy to operate using Time Control. Vacuum pump is included.   Parameter  Vacuum pump set (Oil required) rotary vacuum pump Rotary pumping speed 50 Hz : 8m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s) Vacuuming time < 2 Min Chamber size Φ115*100mm (height) scratch resistant quartz glass  Magnetron target source Target size φ 50*0.1mm(Au)/target source: Au,Ag,Pt Operation method Instruction Manual Weight/size 40kg/307mm length x 260mm wide x 260mm high Power supply AC 110V 60Hz or AC 220V 50Hz Power consumption <1500W Cooling method Air cooling Warranty One year limited warranty with lifetime product support    

Lab DC or RF Magnetron Ion Sputter Coater with Vacuum Pump And Chiller Using in Perovskite Solar Cell Lab Line

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Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication

Auto Vaccum DC Sputter Coater For Multilayer Thin Film Fabrication       Model: TMAX-BY-JS10 – Product Specifications 1. Technical Specifications Table Parameter Specification Model Number TMAX-BY-JS10 Vacuum Pump Oil-required Rotary Vacuum Pump (Explicit oil filling needed) Pumping Speed 50Hz: 16 m³/h (4.4 L/s) • 60Hz: 19.2 m³/h (5.2 L/s) • 20% speed boost at 60Hz Ultimate Vacuum 2 Pa Max Sputtering Current 1.6A Operating Pressure Range 20 Pa – 8 Pa Pump-Down Time <5 min (to 2 Pa) Vacuum Measurement Range Atmospheric pressure to 2×10⁷ mbar Gas Control System Precision Gas Flow Controller Chamber Specifications Ø350 × 240mm (H) • Scratch-resistant quartz glass viewport Target Specifications Ø200mm • Materials: Au, Ag, Pt, Cu (noble/conductive metals) Operation Instruction manual guided Dimensions/Weight 490(L) × 400(W) × 590(H) mm • 70 kg Power Requirements Dual-voltage: AC 110V/60Hz (Americas) or AC 220V/50Hz (Europe/Asia) Power Consumption <1500W Warranty & Support 1-year limited warranty + lifetime technical support 2. Key Features & Competitive Advantages Precision-Oriented Design · Dual-Frequency Pumping: Automatically adapts to 50Hz/60Hz power grids (19.2 m³/h vs 16 m³/h) for global compatibility. · Scratch-Resistant Quartz Viewport: Ensures long-term visibility during deposition without degradation. · Oil-Lubricated Vacuum Pump: Delivers stable 2 Pa base pressure (vs. dry pumps), critical for consistent thin-film quality. Material Versatility · Broad Target Compatibility: Supports Au/Ag/Pt/Cu targets for conductive/noble metal coatings. · Rapid Process Setup: <5-minute pump-down enables efficient batch processing. User-Centric Engineering · Global Voltage Support: No external converter needed for 110V/220V operation. · Compact Footprint: Benchtop design (0.49×0.4×0.59m) saves lab space.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }