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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors
Model Number:
TMAX-PC-JS04Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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4-Target Multilayer Film Metal PVD Sputtering Deposition SystemNext:
DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targets
Desktop Magnetron Sputtering Coating Machine System For Oxides & Ceramics & Semiconductors
Model: TMAX-PC-JS04-Multilayer Thin-Film Fabrication
Technical Specifications
Parameter |
Specification |
Base Vacuum |
6.7×10−5 Pa |
Operating Vacuum (after 1h) |
≤4×10−4 Pa |
Magnetron Targets |
3 (3-inch, permanent magnet, water-cooled, side shutters) |
Target-to-Substrate Distance |
120–200 mm (manually adjustable, scale-indicated) |
Target Tilt Angle |
0–45° |
Substrate Heating |
Iodine-tungsten lamp, max 400°C |
Substrate Size |
Φ60 mm (single-piece) |
Substrate Rotation |
0–50 RPM (motorized) |
Bias Voltage |
0–200 V (adjustable) |
Gas Flow Control |
2-channel MFC, 0–50 sccm range |
Control Functions |
Manual heating/rotation/shutter/vacuum monitoring |
Key Features & Applications
1. Precision & Flexibility
· Adjustable target-substrate geometry for tailored film stress and uniformity.
· Three-target co-sputtering enables multilayer/composite films (e.g., superlattices).
2. High-Quality Deposition
· UHV-compatible chamber minimizes impurities for high-purity films.
· Heated substrate (400°C max) improves crystallinity (e.g., for oxides/semiconductors).
3. Compact Research Tool
· Benchtop design suits small-batch R&D and material screening.
Typical Uses
· Protective coatings (e.g., TiN, DLC for tools).
· Transparent conductive films (e.g., ITO, AZO).
· MEMS/sensor fabrication.
Best for: Labs requiring flexible, high-precision thin-film deposition with manual control.
+86 13174506016
David@tmaxcn.com
