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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film
Model Number:
TMAX-PC-JS08Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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Auto Magnetron Sputtering Deposition System For Metals, Perovskite, Semiconductors, MEMSNext:
Dual-Target PVD Sputtering Machine For Conductive And Biological Multilayer Films
Dual-Target Magnetron Sputtering Coating System For Perovskite & Solar Cell Film
Model: TMAX-PC-JS08-Dual-Target, Multilayer Films Deposition
Equipment Purpose
Designed for nano-scale single/multilayer functional films (hard coatings, metals, semiconductors, dielectrics). Features pre-sputtering cleaning for enhanced adhesion.
System Components
· Vacuum chamber, dual magnetron targets, heating stage, DC/RF power supplies, gas delivery, vacuum pumps, control system.
Technical Parameters
Category |
Specification |
Chamber Structure |
Vertical front-loading; stainless steel/vacuum materials |
Base Pressure |
≤5×10−5 Pa |
Leak Rate |
≤5×10−7 Pa·L/s |
Pressure Rise Rate |
≤10 Pa (after 12 hours, pump off) |
Pumping System |
Domestic molecular pump + mechanical pump |
Targets |
2× 4-inch HV (1 standard-field, 1 strong-field); DC/RF compatible (Kurt J. Lesker) |
Target-Sample Distance |
40–120 mm (multilayer); 80–120 mm (with ion source) |
Power Supplies |
RF: 1000 W, 13.56 MHz (auto-matching); DC: 1000 W (AE brand) |
Sample Stage |
3 substrates; 5–30 RPM rotation; 450°C heating; 1000 V bias |
Film Thickness |
Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm (±5% uniformity over 2-inch area) |
Adhesion Test |
Passes 3-tape peel (glass/Si/ceramic) |
Gas System |
2 MKS mass flow controllers (Ar + reactive gas); mixing capability |
Baking Temperature |
150°C (infrared heating) |
Key Features
1. Dual-Target Flexibility
o Enables co-sputtering or sequential deposition for complex multilayers.
2. High Adhesion & Cleanliness
o Integrated pre-sputtering cleaning and ion-assisted deposition (anode-layer source).
3. Precision Process Control
o Programmable temperature (450°C max), rotation (5–30 RPM), and gas flow.
4. Safety & Reliability
o Interlocks for power/water failures; manual controls for critical operations.
Target Applications
· Research: Nanomaterials, thin-film physics, prototype development.
· Education: Advanced deposition techniques training.
· Industry: Small-batch functional coatings (e.g., optics, electronics).
+86 13174506016
David@tmaxcn.com
