Lab Vertical Type Vacuum Spin Film Coater with Vacuum Chunk Optional 200 to 600mm Substrate

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Lab Automatic Film Coater Machine with Heating Function Suitable for Lithium Battery,PET And Aluminum Foil

Sales Manager: Gia Email: Gia@tmaxlaboratory.com Wechat: Dingqiuna Whatsapp：+86 131 7450 6016 Skype: gia@tmaxcn.com

Graphene Coating Machine Graphene Heat Conduction Film Coater with Return Oven

Graphene Coating Machine Graphene Heat Conduction Film Coater with Return Oven It is applicable to the precise coating production of high thermal conductivity graphene heat conduction film and graphene heat conduction film in the fields of smart phones, tablet computers, smart VR, planetary circuits, electrothermal painting, floor heating film, etc. The coating machine has better price and higher production efficiency   Specification Control system Independent research and development system Uniform coating ＜5% Coating width Effective coating width100-380mm Coating thickness 0.005-3MM（wet film） Coating typoe Doctor blade Tension control Automatic tension adjustment (according to the membrane tension required to adjust) Oven length 10meters(Back to type) Dryingoven temp Normal temperature ~120 degrees (can be segmented constant temperature) Heating method Electrical heating Oven wind force Adjustable Deviation correcting device Automatic rectifying of winding Exhaust air system Suction is adjustable Production speed 1-20 m/min Equipment air pressure 6 KG/cm2 Power supply 380V 50Hz Equipment power 10KW Dimension 2700*1300*1800mm    

Lab Compact Polymer Film Coater With Doctor Blade Coating Head

The hot melt coating machine uses a hot melt adhesive heating tank and a special hot melt adhesive extrusion coating head to achieve uniform coating. Lamination and die-cutting are optional.

Hot Melt Slot Die Flat Coating Machine

Laboratory Desktop Precision Flat Slot Die Coater W/ Heating Vacuum Chunk

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film

PVD Thermal Evaporator Coating System Metal Deposition Coater For Thin Film    TMAX-ZY-ZD02-Research-Grade Thin Film Deposition Equipment System Overview TMAX-ZY-ZD02 benchtop resistive thermal evaporation coating system integrates a turbo-molecular pump vacuum assembly to achieve high-vacuum thin film deposition. Equipped with 4 evaporation sources and a precision thickness control system, it is optimized for rapid multi-layer metal/alloy deposition. Featuring a plug-and-play design, this compact instrument operates reliably in office or lab environments without specialized infrastructure, making it ideal for R&D and small-batch production. Key Advantages 1. Portability & Flexibility ·Compact footprint with multi-environment adaptability (lab/office). 2. User-Centric Design ·One-touch operation with preloaded parameters (100+ metal deposition recipes). ·10" touchscreen for intuitive process control and real-time monitoring. 3. High-Performance Deposition ·4-source simultaneous evaporation (supports 99 layers of metals/alloys/polymers per run). ·Quartz crystal monitoring for nanometer-level thickness accuracy (±3% uniformity). 4.Premium Components ·All-aluminum chamber for efficient heat dissipation. ·Imported turbo-molecular pump (300L/s) ensures ≤6×10−5 Pa ultimate vacuum. 5.Low Maintenance ·Minimal training required; modular design simplifies servicing. Typical Applications · Thin-film material research (metals/dielectrics) · Optical coatings & nanoelectronics · Thin-film sensors & MEMS devices · Custom alloy/polymer multilayer structures Standard Specifications Component Details Chamber 400×350×360mm (H), CNC-machined aluminum Vacuum System 300L/s turbo pump + dual-stage rotary vane pump Vacuum Measurement Full-range gauge (atmosphere to UHV) Evaporation Sources 4 independent thermal sources (cross-contamination-free) Power Supply DC power for multi-layer deposition Thickness Control Quartz crystal monitor + manual/auto mode switching Software Network-upgradable with remote parameter adjustment Optional: · Co-evaporation kit for alloys · 2" substrate heater (400°C max) · Water-cooled rotating sample stage Technical Parameters · Ultimate Vacuum: ≤6×10−5 Pa (after bake-out) · Leak Rate: ≤5.0×10−9 Pa·L/s · Deposition Rate: ≥8 nm/min (varies by material) · Thickness Uniformity: ≤3% (with planetary rotation) Site Requirements Parameter Specification Dimensions 600×720×1200mm (H) Weight 85 kg Environment 23±3°C, <60% RH Power AC 230V, 32A, 50Hz Cooling Water 0.2MPa, 15–25°C, ≥8L/min (optional) Gas Supply 99.9% N2 (optional for venting) Operational Workflow · Fully automated process: Pre-programmed vacuum pumping, substrate heating, and evaporation. · Multi-layer capability: Sequential deposition of 4 materials (up to 99 layers) with customizable thickness/time modes. · Data export: Real-time parameter logging and remote monitoring. Why Choose? · Time-saving: Eliminates complex setup with industry-leading uptime. · Precision: Combines lab-grade vacuum performance with production-level repeatability. · Scalability: Modular options cater to evolving research needs. Ideal for academic labs, startups, and industrial R&D requiring rapid prototyping of advanced thin films.   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }