PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating

PVD Magnetron Sputtering System For Thin Film Deposition In Research, Semiconductor Prototyping and Optical Coating   Model: Lith-SD-JS02-Sputtering System for Research Labs, Semiconductor Prototyping, and Optical Coating Product Overview The Plasma Magnetron Sputtering System (Model: TMAX-SD-JS02) is a compact, user-friendly instrument designed for high-quality thin film deposition. With a quartz chamber (150 × 120 mm) and a maximum sputtering rate of 8 nm/min, it is ideal for research and small-scale production requiring precise, uniform coatings. Compatible with inert gases (Ar, N₂) and versatile metal targets (Au, Ag, Pt, etc.), this system combines efficiency with advanced operational features. Technical Specifications Parameter Specification Quartz Chamber Size 150 × 120 mm Sample Stage Size 70 mm (diameter) Sputtering Area 50 mm (diameter) Max. Vacuum Degree 5 Pa Process Gases Argon, Nitrogen (flow rate adjustable) Max. Sputtering Rate 8 nm/min Power Consumption 200 W Dimensions (W×D×H) 360 × 310 × 150 mm Operating Temperature 0–40°C Relative Humidity < 85% Installation Horizontal desktop placement Key Features & Advantages 1. Intuitive Control & Monitoring 4.3" color touchscreen with graphical interface for real-time display of sputtering current, voltage, and vacuum levels. 2. Flexible Gas & Target Options Adjustable inert gas flow (Ar/N₂) and support for 50 mm diameter metal targets (1–2 mm thickness), enabling quick material swaps and process reproducibility. 3. Modular & User-Centric Design ·Split-type quartz chamber for easy maintenance. ·Height-adjustable sample stage (±20 mm) with rotational alignment. ·Auto-venting post-sputtering simplifies sample handling. 4. Compact & Reliable ·Space-saving footprint with multi-layered software protections for extended durability. 5. Uniform Film Quality ·Dense, homogeneous coatings compatible with noble and transition metals (Au, Ag, Pt, etc.). Target Applications · Research Labs: Thin film studies, surface engineering, and material science. · Semiconductor Prototyping: Deposition of conductive/metallic layers. · Optics & Electronics: Functional coatings for sensors or display components. Note: Optimized for small substrates (≤50 mm) and low-to-medium throughput requirements.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }