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Sputter Coater for SEM Sample Preparation

Film Deposition System For Perovskite Solar Cells, OLEDs,OPVs

  • Model Number:

    TMAX-PD-DZ01
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

Film Deposition System For Perovskite Solar Cells, OLEDs,OPVs 

 

 

TMAX-PD-DZ01-Advanced Thin-Film Deposition System


Product Overview

The TMAX-PD-DZ01 is a high-performance vacuum deposition system designed for perovskite solar cells, OLEDs, lithium batteries, quantum dot LEDs (QLEDs), and organic photovoltaics (OPVs). Supporting thermal evaporation (resistive & e-beam) and organic vapor deposition, it enables the coating of metals (Au, Ag, Ti, Cr, Mo), oxides (SiO₂, ITO, AZO, NiO), and organic semiconductors in a fully inert glovebox-integrated environment.


Key Features & Competitive Advantages

1. Space-Optimized Glovebox Integration

✔ Dual-Rail Sliding Door – Reduces glovebox space usage by >30% vs. conventional swing-door systems.
✔ Compact External Footprint – No extra lab space required beyond the glovebox.

2. Intelligent Control & Safety

✔ Siemens PLC + Touchscreen HMI – Enables manual/auto switching, remote PC control, and real-time process monitoring.
✔ Multi-Stage Interlock Protection – Prevents operator errors (e.g., venting under high vacuum).
✔ Leak & Overheat Alarms – Auto-shutdown safeguards sensitive samples.

3. Superior Thin-Film Performance

✔ Ultra-High Vacuum (UHV) Base Pressure – <3×10⁻⁵ Pa minimizes contamination for high-purity films.
✔ Industry-Leading Uniformity (±3%) – Enabled by planetary rotation (5–30 RPM) + adjustable dome height.
✔ Ion-Assisted Deposition (Optional) – Enhances adhesion density by >20% for metal/oxide layers.

4. Modular Source Configuration

✔ Multi-Source Compatibility – Simultaneously supports:

· 8–10 kW E-beam (4–8 crucible positions)

· 4 Resistive Sources (Max. 1500°C)

· 2 Organic Vapor Cells (Precision temp. control ±1°C)
✔ Rapid Material Switching – Crucible turret reduces downtime by >50% vs. single-source systems.


Detailed Technical Specifications

Parameter

Specification

Performance Impact

Chamber Dimensions

500×500×600 mm (Standard) / 600×650×800 mm (Large)

Fits wafer-scale (200×200 mm) substrates; customizable for roll-to-roll R&D.

Base Vacuum

≤3×10⁻⁵ Pa

Critical for oxide & organic film purity; outperforms competitors (typical 5×10⁻⁵ Pa).

Holding Pressure

≤8×10⁻⁴ Pa (30 min pump-down) / ≤5 Pa (12 hrs)

Ensures long-duration process stability for tandem device fabrication.

Deposition Rate

0.1–10 Å/s (e-beam) / 0.5–5 Å/s (resistive)

Wide range supports ultrathin barriers (<10 nm) to thick electrodes (>500 nm).

Substrate Heating

RT–600°C (Optional)

Enables in-situ annealing for perovskite crystallization or metal-oxide doping.

Thickness Control

Quartz crystal monitor (±0.1 nm) + optical feedback

±3% uniformity across 200 mm wafers; repeatable batch-to-batch results.


Application-Specific Benefits

▶ Perovskite Solar Cells (PSCs)

· All-in-One Processing – From ITO/SnO₂ ETL to Au/Ag electrodes, all in O₂/H₂O-free conditions.

· Co-Evaporation Capability – Precisely tune FA/MA/Cs perovskite stoichiometry via multi-source control.

▶ OLED/QLED Displays

· Organic-Metal Hybrid Deposition – Seamlessly switch between Alq3 emissive layers and Al cathodes.

· Shadow Mask Compatibility – ≤200 mm substrates enable RGB pixel patterning.

▶ Solid-State Batteries

· Lithium Anode Protection – Deposit LiPON/Li₃PS₄ solid electrolytes without air exposure.

· High-Rate Metal Evaporation – >1 μm/min Ag current collectors for fast prototyping.

▶ Academic & Industrial R&D

· Glovebox Coupling – Direct transfer to spin-coating/characterization modules (e.g., IV/CV testing).

· Future-Proof Upgrades – Add sputtering/PECVD via flange ports.

Thin Film System

Thermal Evaporation System

Thermal Evaporation System