Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication

Electron-beam Metal Thermal Evaporator Coating System For Nano Film Fabrication 

TMAX-TK-DZ01-Precision Thin-Film Deposition Solution for Research & Industry

Technical Specifications

Key System Advantages

1. Superior Thin Film Quality

·Ultra-high vacuum environment (<5×10⁻⁵ Pa) minimizes contamination

·Optional ion-assisted deposition enhances film density and adhesion

·Excellent thickness uniformity (±5%) for precision applications

2. Enhanced Process Capabilities

·Dual evaporation sources (E-beam + thermal) for material flexibility

·Heated rotating substrate stage (300°C) for uniform deposition

·Modular design allows future upgrades (optical monitoring, automation)

3. User-Friendly Operation

·Intuitive PLC+touchscreen control interface

·Comprehensive safety interlocks (cooling, vacuum, power)

·Compact footprint (2.5m×1.6m) optimized for lab spaces

Primary Application Areas

Optical Coatings
• Anti-reflection coatings
• Laser mirrors and filters
• IR optical components

Electronic & Semiconductor Films
• Transparent conductors (ITO, AZO)
• Dielectric layers (SiO₂, Al₂O₃)
• Semiconductor device fabrication

Functional Material Research
• Ferroelectric films (PZT, BST)
• Magnetic thin films
• 2D material encapsulation

Ideal For:
✓ Academic research laboratories
✓ Industrial R&D centers
✓ Small-scale precision coating production
✓ Advanced material development projects