High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System

High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System     Model: TMAX-PC-JS02-D-Shaped Magnetron Sputtering Coater Main Purpose Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories. System Composition · Vacuum chamber system (sputtering chamber) · Target system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Front-opening door mechanism · Electrical control system Technical Specifications Parameter Specification Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/s Vacuum Recovery Time 40 min to 6.6×10 Pa (after N2 purge) Vacuum Chamber D-shaped, 400 × 350 × 300 mm Sample Stage 3" × 3", 3.2 mm thickness Magnetron Targets 3 targets (2 standard + 1 high-strength) Effective Sputtering Area 3" × 3" Target Diameter Φ50 mm (water-cooled) Target-to-Substrate Distance 50–90 mm (adjustable) Substrate Bias Voltage -200 V Sample Turntable 1 position (holds 2" substrates) Gas Flow System 2-channel mass flow controller Film Thickness Monitor 0–999,999 Å Pumping Options Turbo molecular pump or cryogenic pump + dry scroll pump Key Features & Applications 1. High Precision & Versatility · Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings. · Adjustable target-substrate distance ensures optimized film uniformity. 2. Advanced Control & Monitoring · Computerized real-time tracking of deposition parameters enhances repeatability. · Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering. 3. Efficient & Reliable Vacuum System · Fast vacuum recovery minimizes downtime. · Dual pumping options (turbo or cryogenic) adapt to different process requirements. 4. User-Friendly Design · D-shaped chamber & front-opening door facilitate easy sample loading. · Optional heating expands compatibility with temperature-sensitive materials. Ideal for: · Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering. · Functional film development for optics, wear resistance, and electronic devices. · Prototype fabrication requiring high-precision, customizable coatings. 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }