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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System
Model Number:
TMAX-PC-JS02Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
Previous:
DC/RF Nano Sputtering Coater Film Deposition Equipment With Rotatable Triple-targetsNext:
Lab Multi-target Magnetron Sputtering System For Compound Film Deposition
High Vacuum Glove Box Metal&Non-Metal Target Sputtering Coating System
Model: TMAX-PC-JS02-D-Shaped Magnetron Sputtering Coater
Main Purpose
Designed for the preparation of nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, dielectric films, and other advanced thin-film materials. Widely used in universities, research institutes, and small-batch production in scientific laboratories.
System Composition
· Vacuum chamber system (sputtering chamber)
· Target system
· Sample stage system
· Vacuum pumping & measurement system
· Gas flow system
· Control system
· Film thickness monitoring system
· Front-opening door mechanism
· Electrical control system
Technical Specifications
Parameter |
Specification |
Ultimate Vacuum |
6.7×10-5 Pa |
System Leak Rate |
1×10-7 Pa·L/s |
Vacuum Recovery Time |
40 min to 6.6×10 Pa (after N2 purge) |
Vacuum Chamber |
D-shaped, 400 × 350 × 300 mm |
Sample Stage |
3" × 3", 3.2 mm thickness |
Magnetron Targets |
3 targets (2 standard + 1 high-strength) |
Effective Sputtering Area |
3" × 3" |
Target Diameter |
Φ50 mm (water-cooled) |
Target-to-Substrate Distance |
50–90 mm (adjustable) |
Substrate Bias Voltage |
-200 V |
Sample Turntable |
1 position (holds 2" substrates) |
Gas Flow System |
2-channel mass flow controller |
Film Thickness Monitor |
0–999,999 Å |
Pumping Options |
Turbo molecular pump or cryogenic pump + dry scroll pump |
Key Features & Applications
1. High Precision & Versatility
· Suitable for research and small-scale production of high-performance thin films, including optical, electronic, and protective coatings.
· Adjustable target-substrate distance ensures optimized film uniformity.
2. Advanced Control & Monitoring
· Computerized real-time tracking of deposition parameters enhances repeatability.
· Flexible gas flow control (2-channel MFC) supports reactive and non-reactive sputtering.
3. Efficient & Reliable Vacuum System
· Fast vacuum recovery minimizes downtime.
· Dual pumping options (turbo or cryogenic) adapt to different process requirements.
4. User-Friendly Design
· D-shaped chamber & front-opening door facilitate easy sample loading.
· Optional heating expands compatibility with temperature-sensitive materials.
Ideal for:
· Academic & industrial R&D in materials science, nanotechnology, and semiconductor engineering.
· Functional film development for optics, wear resistance, and electronic devices.
· Prototype fabrication requiring high-precision, customizable coatings.
This system combines high deposition control, flexible configuration, and robust performance, making it a preferred choice for advanced thin-film research and development.
+86 13174506016
David@tmaxcn.com
