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Sputter Coater for SEM Sample Preparation

High Vacuum Benchtop Magnetron Co-sputtering System Equipment

  • Model Number:

    TMAX-BY-JS04
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

High Vacuum Benchtop Magnetron Co-sputtering System Equipment 

 

TMAX-BY-JS04-Various weakly magnetic targets


Specification

Category

Specification

Target Material

Various weakly magnetic targets

Target Size

Ø60-80mm (weakly magnetic targets)

Control Mode

Manual operation

Chamber

Borosilicate glass, Ø180mm × H240mm

Sample Stage

Ø180mm (compatible with Ø80mm stage)

Sputtering Gas

Supports multiple gases (e.g., Ar)

Vacuum System

- Turbo molecular pump (80L/s) 

 - Two-stage high-performance vacuum pump

Sputtering Targets

- Standard: Au (60mm × 0.1mm) 

 - Optional: Ag, Pt (customizable)

Sputtering Current

0-500A

Ultimate Vacuum

5×10⁻⁴ Pa

Operating Voltage

220V, 50Hz

Key Features & Applications

Features:

High Deposition Rate – Enhanced plasma confinement for efficient material utilization.
✔ Low Substrate Heating – Minimized thermal impact on sensitive materials.
✔ Compact Benchtop Design – Ideal for lab-scale thin-film research.
✔ Flexible Target Options – Supports Au, Ag, Pt, and other weakly magnetic materials.

Typical Applications:

· Semiconductors & Microelectronics – Conductive layers, MEMS, sensors.

· Optical Coatings – Reflective/anti-reflective films.

· Material Science – Nanostructured thin films, surface engineering.


Magnetron Sputtering Equipment


Vacuum Magnetron Sputtering System