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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
High Vacuum Benchtop Magnetron Co-sputtering System Equipment
Model Number:
TMAX-BY-JS04Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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High Vacuum Benchtop Magnetron Co-sputtering System Equipment
TMAX-BY-JS04-Various weakly magnetic targets
Specification
Category |
Specification |
Target Material |
Various weakly magnetic targets |
Target Size |
Ø60-80mm (weakly magnetic targets) |
Control Mode |
Manual operation |
Chamber |
Borosilicate glass, Ø180mm × H240mm |
Sample Stage |
Ø180mm (compatible with Ø80mm stage) |
Sputtering Gas |
Supports multiple gases (e.g., Ar) |
Vacuum System |
- Turbo molecular pump (80L/s) - Two-stage high-performance vacuum pump |
Sputtering Targets |
- Standard: Au (60mm × 0.1mm) - Optional: Ag, Pt (customizable) |
Sputtering Current |
0-500A |
Ultimate Vacuum |
5×10⁻⁴ Pa |
Operating Voltage |
220V, 50Hz |
Key Features & Applications
Features:
✔ High Deposition Rate – Enhanced plasma confinement for efficient material utilization.
✔ Low Substrate Heating – Minimized thermal impact on sensitive materials.
✔ Compact Benchtop Design – Ideal for lab-scale thin-film research.
✔ Flexible Target Options – Supports Au, Ag, Pt, and other weakly magnetic materials.
Typical Applications:
· Semiconductors & Microelectronics – Conductive layers, MEMS, sensors.
· Optical Coatings – Reflective/anti-reflective films.
· Material Science – Nanostructured thin films, surface engineering.
