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Sputter Coater for SEM Sample Preparation

High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

  • Model Number:

    TMAX-HZ-JS04
  • Input Power:

    2000W
  • Compliance:

    CE Certified
  • Warranty:

    One Year limited warranty with lifetime support
  • Shipping Port:

    Xiamen
  • MOQ:

    1
  • Payment:

    L/C D/A D/P T/T Western Union
  • Delivery Time:

    5 days
Product Details

High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater

 

 

Model: TMAX-HZ-JS04- High-Vacuum Dual-Target Sputtering Coater


Technical Parameters

Category

Specification

Model

TMAX-HZ-JS04

Vacuum System

Oil-free diaphragm pump + molecular pump

Ultimate Vacuum

≤1.0×10⁻⁴ Pa

Pressure Measurement

Full-range cold cathode gauge + front-end Pirani gauge

Gas Control

MFC (Mass Flow Controller) for Ar/O₂/N₂

Target Configuration

Dual targets (independent control, alternate/synchronous sputtering)

Target Compatibility

Metals, alloys, compounds (custom sizes available)

Optional Feature

Real-time thickness monitoring (nanometer precision)

Cooling System

Energy-efficient target cooling

Safety Protections

Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent


Key Features

1. Dual-Target Flexibility

·Enables multi-material deposition(e.g., bilayers, graded films, or interfaces) in a single run.

2. High-Vacuum Precision

·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films.

3. Intelligent Process Control

·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides).

4. User-Optimized Design

·Energy-saving pumps and cooling reduce operational costs without compromising performance.


Typical Applications

· Semiconductors: Electrode/metallization layers, barrier films.

· Optics: Anti-reflective, conductive, or hard coatings.

· Energy: Thin-film batteries, solar cell layers.

· Research: Nanomaterials, heterostructures, surface engineering.


Why Choose?

· Lab to Production: Scalable for both R&D prototyping and industrial batch processing.

· Safety & Reliability: Automated safeguards protect equipment and users.

· Customizable: Adaptable to diverse materials and film architectures.

 Dual-Target Magnetron Sputtering

 

 Magnetron Ion Sputtering