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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater
Model Number:
TMAX-HZ-JS04Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
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Magnetron Sputter Depostion Coater Machine PVD System For SEMNext:
Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation
High-Vacuum Dual-Target Magnetron Ion Sputtering Coating System Coater
Model: TMAX-HZ-JS04- High-Vacuum Dual-Target Sputtering Coater
Technical Parameters
Category |
Specification |
Model |
TMAX-HZ-JS04 |
Vacuum System |
Oil-free diaphragm pump + molecular pump |
Ultimate Vacuum |
≤1.0×10⁻⁴ Pa |
Pressure Measurement |
Full-range cold cathode gauge + front-end Pirani gauge |
Gas Control |
MFC (Mass Flow Controller) for Ar/O₂/N₂ |
Target Configuration |
Dual targets (independent control, alternate/synchronous sputtering) |
Target Compatibility |
Metals, alloys, compounds (custom sizes available) |
Optional Feature |
Real-time thickness monitoring (nanometer precision) |
Cooling System |
Energy-efficient target cooling |
Safety Protections |
Overpressure/overcurrent/overheat protection, vacuum interlock, emergency vent |
Key Features
1. Dual-Target Flexibility
·Enables multi-material deposition (e.g., bilayers, graded films, or interfaces) in a single run.
2. High-Vacuum Precision
·Ultra-low base pressure (≤1.0×10⁻⁴ Pa) minimizes contamination for high-purity films.
3. Intelligent Process Control
·MFC-regulated gas flow ensures repeatable reactive sputtering (e.g., oxides/nitrides).
4. User-Optimized Design
·Energy-saving pumps and cooling reduce operational costs without compromising performance.
Typical Applications
· Semiconductors: Electrode/metallization layers, barrier films.
· Optics: Anti-reflective, conductive, or hard coatings.
· Energy: Thin-film batteries, solar cell layers.
· Research: Nanomaterials, heterostructures, surface engineering.
Why Choose?
· Lab to Production: Scalable for both R&D prototyping and industrial batch processing.
· Safety & Reliability: Automated safeguards protect equipment and users.
· Customizable: Adaptable to diverse materials and film architectures.
