Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation

Small Large-Target Magnetron Sputtering PVD Coater Equipment For TEM Preparation

Model:  TMAX-HZ-JS02-Low-Temperature SEM Preparation

Key Features & Applications

The  TMAX-HZ-JS02 Magnetron Sputtering System integrates advanced vacuum technology with intelligent automation, delivering high uniformity, efficiency, and versatility for precision thin-film deposition. Its large-target design and planar magnetron cathode minimize plasma-induced thermal damage, making it ideal for temperature-sensitive samples (e.g., polymers, fibers, biological specimens) and high-resolution SEM preparation.

Technical Parameters

System Components

1. Sputtering Source: Planar magnetron cathode for Au/Pt/Pd/Ag deposition.

2. Power Supply: Constant-current DC (300–600 V, ±1 mA precision).

3. Vacuum System: Rotary vane pump (<1 Pa), Pirani monitoring.

4. Automation: One-touch operation with parameter memory.

5. Data Display: Real-time curves for current, voltage, and vacuum status.

Advantages

· Nano-scale Coating: Particle size <5 nm, ideal for high-resolution SEM.

· Low Thermal Impact: Magnetron technology reduces sample heating.

· High Throughput: 12-sample capacity with auto-rotation for uniformity.

· Plug-and-Play: No specialized training required.

Ideal for: Material science, biology, and conductive/thermal enhancement of non-metallic samples.

Operation Notes

· Target Replacement: Tool-free design with shielded ring mechanism.

· Maintenance: Oil-lubricated pump (included) with visual oil-level window.

· Gas Connection: Supports Ar/N₂ or ambient air (6 mm OD tubing).