Magnetron Sputter Depostion Coater Machine PVD System For SEM

Magnetron Sputter Depostion Coater Machine PVD System For SEM

Model:  TMAX-HZ-JS03- Au/Carbon Coating Magnetron Sputter Coater

Product Overview

The  TMAX-HZ-JS03 Dual-Target Magnetron Ion Sputtering Coater, independently developed with cutting-edge technology, sets a new benchmark for sample preparation instruments. It integrates dual-target co-sputtering and multi-layer single-sputtering capabilities, featuring a standard rotating/tilting module for multi-angle, uniform film coverage. This design eliminates charging effects, enhances sample contrast, and delivers high-resolution, true-to-life morphological characterization—ideal for advanced material science and biological research.

Technical Specifications

Instrument Highlights

1. SEM-Optimized Coating Performance

· Dual-target configuration: Enables sequential Au/Pt and Carbon deposition without breaking vacuum

· 2-10Pa working vacuum: Specialized for minimum oxidation during conductive coating

· <5nm particle size: Finer than conventional sputter coaters (typically 10-20nm)

2. Intelligent Process Control

· 300-700V voltage range with 1mA precision – 30% wider than standard systems for optimal film density

· Real-time plasma monitoring prevents arcing on sensitive samples

3. Ergonomic Design

· 160mm large chamber: Accommodates tall SEM stubs (up to 25mm) and irregular specimens

· Tool-free target change

Target Applications

▸ Life Science: Coating for pollen, plant tissues, and hydrated biological samples
▸ Materials Research: Nanowires, polymer films, and porous materials
▸ Failure Analysis: PCB cross-sections and insulating components

Operational Advantages

· One-cycle coating: 12 samples/batch (50% more than competitors)

· Zero thermal damage: Magnetron confinement keeps samples <40°C

· Self-diagnostics: Automatic pump protection and target life counter