Lab DC/RF Magnetron Sputtering Machine Equipment For SEM

Lab DC/RF Magnetron Sputtering Machine Equipment For SEM       Model:  TMAX-PD-JS01-DC/RF Sputtering, Multi-Target, Uniform Coating (±5%), Fast Deposition Product Overview The TMAX-PD-JS01 is a compact magnetron sputtering system designed for laboratory-scale thin-film deposition. Compatible with both DC and RF sputtering sources, it supports the coating of metals, non-metals, and compound films (e.g., ITO). Ideal for academic and industrial research, it enables the preparation of single/multilayer films and facilitates advanced material/process development. Key Features 1. Robust Construction ·All-stainless-steel vacuum chamber ensures durability and operational safety. ·Optimized gas path design for enhanced process control. 2. Space-Efficient & Modular ·Compact footprint (500×360×380mm) with modular expandability, maximizing lab space utilization. 3. High-Efficiency Vacuum System ·Hybrid mechanical + imported molecular pump achieves high vacuum (≤3×10⁻⁵ Pa) in 15–20 minutes, reducing downtime. 4. Precision Process Control ·Uniformity: ≤±5% over Ø80mm substrate area. ·Rotating Substrate Holder: Adjustable speed (0–20 RPM) with magnetic fluid sealing for stable deposition. 5. Flexible Configuration ·Sputtering Sources: 2–3 × 2-inch targets (DC/mid-frequency/RF). ·Gas System: 1–3 gas inlets with ±1% flow accuracy (20 sccm). Technical Specifications Parameter Specification Vacuum Chamber Ø260 × H280mm (304 stainless steel, cylindrical, viewport) Vacuum System Mechanical pump + imported molecular pump Base Pressure ≤3×10⁻⁵ Pa Pump-down Time ≤3×10⁻⁴ Pa in 15min Substrate Holder Max. Ø80mm, rotation speed 0–20 RPM (adjustable) Sputtering Sources 2–3 × 2-inch targets; 1KW DC/mid-frequency/RF power supply Uniformity ≤5% (Ø80mm area) Gas Control 1–3 channels, ±1% accuracy (20 sccm max) Control Mode Manual button or PLC touchscreen (with safety interlocks) Power Supply AC220V/50Hz, 2.5KW Dimensions (L×W×H) 500 × 360 × 380mm Optional Upgrades: Substrate heating/cooling, dry pump, additional flow meters, water chiller. Target Applications · Research: Thin-film studies (metals, oxides, semiconductors). · Education: Lab demonstrations and student projects. · Industry: Prototyping for electronics, optics, and energy materials (e.g., ITO for solar cells). Why choose ? · Fast turnaround: Rapid pump-down accelerates experimental cycles. · Scalable: Modular design adapts to evolving research needs. · User-centric: Intuitive controls and safety features streamline operation.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; 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