Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation      Model: TMAX-JY-JS02-Cold Magnetron Sputtering Deposition System Product Description The TMAX-JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications. Key Features · "Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples. · Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples. · Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling. · Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality, unaffected by chamber pressure. · Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick and easy target replacement. Technical Specifications Sputtering System Parameter Specification Target Material Standard: Pt (57mm diameter × 0.1mm thickness)  Optional: Au, Au/Pd, Pt/Pd Sample Stage Rotation 0–60 rpm (continuously adjustable) Sample Stage Tilt -45° to +45° (continuously adjustable) Stage Diameter 40mm (holds 4 standard sample holders; custom sizes available) Sputtering Current Microprocessor-controlled (0–99 mA) with safety interlock Vacuum Range Atm ~3 Pa Control Method Programmable (1–999s) with Start/Pause buttons; automatic pumping/sputtering/venting Vacuum Pump Parameter Specification Pumping Speed 133 L/min Ultimate Vacuum 0.05 Pa Noise Level 56 dB Applications & Advantages · Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage, critical for delicate or heat-sensitive materials. · Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in semiconductor, nanotechnology, and materials research. · User-Friendly Operation: Automated processes and ergonomic design enhance efficiency and reproducibility. · Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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Auto Magnetron Sputtering Deposition System For Metals, Perovskite, Semiconductors, MEMS

Auto Magnetron Sputtering Deposition System For Metals, Perovskite, Semiconductors, MEMS     Model: TMAX-PC-JS09-Multi-target, Multi-film Deposition 1. Specifications Parameter Specification Chamber Design Single-chamber, vertical front-loading (stainless steel/vacuum-grade materials) Base Vacuum ≤5×10−5 Pa Pump-down Time 100 min (to ≤5×10−4 Pa after N2 venting) Leak Rate ≤5×10−7 Pa·L/s Magnetron Targets 3 × 3-inch (2 standard-field, 1 high-field, DC/RF compatible, Kurt J. Lesker) Power Supplies 1 × RF (600 W, 13.56 MHz), 2 × DC (1000 W, AE Corp.) Substrate Stage 3-position, rotating (5–30 RPM), heated (up to 450°C), bias voltage (1000 V) Target-Substrate Distance 40–120 mm (80–120 mm with ion source) Gas Control 2-channel MKS mass flow controllers (Ar + reactive gases) Film Thickness Uniformity ≤5% on 2-inch area (Cu/Al: 4–5 µm, Ni/PTFE: 1–2 µm) Adhesion Test Passes 3× tape test (glass, Si, ceramic substrates) Additional Features Reverse sputtering, anode-layer ion source, safety interlocks, computer control 2. Key Features & Benefits ✔ High-Precision Deposition · Uniform films with ≤5% thickness variation, ideal for research and prototyping. · Multi-layer capability (e.g., Al/Ni, Al/PTFE) with automated target switching. ✔ Advanced Process Control · Computer-controlled deposition (temperature, rotation, gas flow). · Ion-assisted deposition enhances film density and adhesion. ✔ Flexible & Reliable Design · Three-target system supports diverse materials (metals, dielectrics, semiconductors). · Substrate heating (450°C) and rotation ensure high-quality coatings. ✔ Research-Optimized Safety · Fail-safe protections (water/power interlocks, anti-misoperation). · Controlled environment with bake-out and contamination liners. 3. Ideal Applications · Academic & Industrial R&D: Thin-film studies, optoelectronics, protective coatings. · Semiconductor & MEMS: Precise metal/dielectric layers for device fabrication. · Advanced Materials: Hard coatings (e.g., tooling), functional films (e.g., PTFE). 4. Why Choose This System? · Repeatable results with automated workflows. · Imported critical components (Kurt J. Lesker targets, AE power supplies) ensure reliability. · Compact footprint with full-featured capabilities for labs.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; } html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-anchor { border:1px dashed #666; width:16px; height:16px; } .ke-script, .ke-noscript, .ke-display-none { display:none; font-size:0; width:0; height:0; } .ke-pagebreak { border:1px dotted #AAA; font-size:0; height:2px; }