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Sputter Coater for SEM Sample Preparation

Metal Evaporation Coating Equipment Manufacturer For Conductive, Semiconductor, Optical Coatings

  • Model Number:

    TMAX-PC-DZ02

  • Input Power:

    2000W

  • Compliance:

    CE Certified

  • Warranty:

    One Year limited warranty with lifetime support

  • Shipping Port:

    Xiamen

  • MOQ:

    1

  • Payment:

    L/C D/A D/P T/T Western Union

  • Delivery Time:

    5 days
Product Details

Metal Evaporation Coating Equipment Manufacturer For Conductive, Semiconductor, Optical Coatings 

 

TMAX-PC-DZ02-Dual-Gun Electron Beam Evaporation Coating System

Primary Applications

Designed for high-throughput deposition of conductive films, semiconductor films, ferroelectric films, optical coatings, and other advanced thin-film materials. Ideal for industrial-scale production and laboratory R&D.

System Configuration

The system consists of:

· Evaporation Chamber: U-shaped design (1200 × 9000 × 800 mm), front-loading door, rear-mounted pumping system.

· Dual E-gun Evaporation Sources: Equipped with two high-power electron guns for simultaneous or sequential deposition.

· Thermal Evaporation Electrodes: Supports resistive heating for supplementary material deposition.

· Rotating Substrate Heater: Ensures uniform film thickness distribution.

· Gas Supply System: Precision mass flow controller (MFC) for reactive or inert gas introduction.

· Vacuum System: High-efficiency pumping system with ultra-low base pressure.

· Vacuum Measurement: Real-time monitoring of chamber pressure.

· Computer Control System: Automated process control with user-friendly interface.

· Mechanical Frame: Stable and vibration-resistant structure for precision coating.

Technical Specifications

Parameter

Specification

Ultimate Vacuum

≤6.7×10-4 Pa

Pump-Down Time (1×10-5 Pa → 5×10-3 Pa)

≤20 min

System Leak Rate

≤6.7×10-7Pa·L/s

Chamber Dimensions

1200 × 9000 × 800 mm (U-shaped, front-opening)

Electron Guns (2 sets)

Anode Voltage: 10 kV

Crucible (Water-Cooled)

24-well design, 11 ml capacity per well

Power Output

0–10 kW (adjustable)

Optional Resistive Source

Compatible with thermal evaporation materials

Substrate Capacity

Holds 20× 4-inch substrates per batch

Substrate Stage

Continuous rotation (5–60 rpm), adjustable source-to-substrate distance (350 mm)

Heating Temperature

Up to 400°C (±1°C accuracy)

Gas Flow Control

1-channel mass flow controller (MFC)

Thickness Monitor

Quartz Crystal Microbalance (QCM), display range: 0–99,999 Å (0–999.99 nm)

Advantages & Applications

✔ High Deposition Rate & Uniformity – Dual e-gun design enables fast, large-area coating with excellent thickness control.
✔ Multi-Material Compatibility – Supports metals, oxides, semiconductors, and dielectrics with optional resistive heating.
✔ Precision Process Control – Automated QCM monitoring ensures repeatable film quality.
✔ Scalable Production – Optimized for batch processing with high substrate capacity.
✔ Stable Heating & Rotation – Reduces stress and improves adhesion for high-performance films.

Ideal for:

· Semiconductor & MEMS fabrication

· Optical & anti-reflective coatings

· Thin-film solar cells & sensors

· Academic & industrial research

Coater For Perovskite

 

Related Tags :

Optical Coating Equipment Metal Evaporation Manufacturer Semiconductor Coating Equipment
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