Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating

Versatile Magnetron Sputtering System For Functional Metal Film Deposition Coating     Model: TMAX-PC-JS01- Versatile Magnetron Sputtering System For Functional Film Deposition Coating Application: Designed for the preparation of nanoscale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor films, and dielectric films. It is widely suitable for scientific research and small-batch production in universities and research institutes. Equipped with an anode-layer ion source for pre-cleaning and assisted deposition, as well as a reverse sputtering function to enhance film quality and adhesion. System Configuration: The system consists of a sputtering vacuum chamber, permanent magnet sputtering targets (3 targets), a single-substrate heating stage, DC/RF power supplies, gas supply system, pumping system, vacuum measurement, electrical control system, and mounting platform. Technical Specifications Parameter Specification Chamber Structure Vertical, top-loading; stainless steel & vacuum-compatible materials Base Pressure (Sputtering Chamber) ≤5×10⁻⁶ Pa Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤1 Pa (after 12 hours of pump shutdown) Pumping System Domestic molecular pump + mechanical pump Magnetron Targets 3 × 3-inch HV-compatible (2 standard field, 1 strong field) Power Supplies RF: 600 W, 13.56 MHz (auto-matching); DC: 2 × 1000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 450°C, programmable control Film Thickness Cu/Al: 4–5 μm; Ni/PTFE: 1–2 μm Uniformity (2-inch area) ≤5% deviation Adhesion Test Withstands 3 tape-peeling tests (glass/si/ceramic) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer for cleaning & assisted deposition Gas Control 2 MKS mass flow controllers (reactive/Ar); gas mixing Baking Temperature 150°C (infrared heating) Safety Features Water/power failure interlock; anti-misoperation Key Features & Suitability 1. Precision Deposition ·Supports DC/RF sputtering for diverse materials (metals, semiconductors, dielectrics). ·Ion-assisted deposition enhances film density and adhesion. 2. High Vacuum Stability ·Ultra-low base pressure (≤5×10⁻⁶ Pa) ensures contamination-free films. ·Low leak rate maintains consistent process conditions. 3. User-Centric Design ·Vertical loading simplifies sample handling. ·Programmable substrate heating (up to 450°C) for optimized film growth. 4. Quality Assurance ·≤5% thickness uniformity and rigorous adhesion standards (tape test). ·Reverse sputtering and ion source for pre-deposition cleaning. 5. Research & Small-Batch Production ·Ideal for universities, labs, and industrial R&D in optics, electronics, and coatings.         html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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