SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal

SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal      Glovebox-Compatible SEM Sample Coater for Beam-Sensitive Materials 1. System Overview ✔ Non-conductive sample coating (Au/Ag/Pt) for SEM imaging ✔ Temperature-sensitive substrates (<60°C process temp) ✔ High-quality thin film deposition with minimized thermal damage 2.  Core parameter Parameter Specification Ultimate Vacuum 4×10⁻² mbar Base Vacuum 1 Pa Pump Down Time <1 minute Vacuum Pump Rotary Vane (2 L/s, Oil-lubricated) Vacuum Measurement Mechanical Gauge (Atmosphere-10⁻² mbar) 3. Cold Sputtering Technology: Patented magnetic confinement reduces substrate heating 4. Glovebox-Adaptable: Optional configuration for inert atmosphere processing Parameter Specification Model TMAX-BY-JS08 Sputtering Type DC Magnetron (Physical Vapor Deposition) Target Materials (Standard) Au (50mmØ×0.1mm) Optional Target Materials Ag, Pt, Cr Maximum Substrate Size Ø70mm (customizable) Chamber Material Borosilicate Glass (160mmØ×120mmH) System Dimensions (W×D×H) 300×360×380 mm Weight 28 kg