4-Target Multilayer Film Metal PVD Sputtering Deposition System

4-Target Multilayer Film Metal PVD Sputtering Deposition System     Model: TMAX-PC-JS05-Target Multi-Mode Sputtering (DC + RF + Strong Magnetic Field) Technical Parameters Category Specification Chamber Structure Horizontal design, electric lift-off top cover, stainless steel/vacuum materials Base Vacuum ≤5×10⁻⁵ Pa Working Vacuum ≤5×10⁻⁴ Pa (achieved in 100 min after pump-down) Leak Rate ≤5×10⁻⁷ Pa·L/s Pressure Rise Rate ≤10 Pa (after 12 h shutdown) Pumping System Domestic molecular pump + mechanical pump Target Configuration 4 × 6-inch targets (3 standard-field, 1 strong-field); DC/RF, max 5,000 W Target-Substrate Distance 40–120 mm (adjustable) Substrate Heating Max 400°C, programmable rate/dwell time Film Thickness Uniformity ≤5% (2-inch area; Cu/Al: 4–5 µm; Ni/PTFE: 1–2 µm) Adhesion Standard Passes 3× tape peel tests (glass/Si/ceramic substrates) Pre-Cleaning Reverse sputtering capability Ion Source Anode-layer ion source (cleaning + assisted deposition) Gas Control 2 MKS mass flow controllers (reactive/Ar gases), mixing/pressure adjustment Baking Temperature 150°C (infrared heating) Safety Protections Water/power failure interlock, anti-misoperation design Automation PC-controlled (target switching, rotation, temperature, shutters) Key Features & Suitability Analysis 1. Precision Deposition for Advanced Films · Nanoscale control: Achieves ≤5% thickness uniformity for functional films (e.g., semiconductors, hard coatings). · Multi-material flexibility: Simultaneously supports metals (Cu/Al), dielectrics (PTFE), and compounds via 4 targets. 2. Enhanced Process Stability · Ion-assisted deposition improves film adhesion and density. · Pre-sputtering cleaning ensures contamination-free substrates. 3. User-Friendly Operation · Automated PC control simplifies complex processes (e.g., multilayer deposition). · Horizontal chamber design enables quick sample loading. 4. Industrial & Research Versatility · R&D labs: Ideal for prototyping optical, electronic, or wear-resistant coatings. · Small-batch production: Reliable for precision coatings in aerospace or semiconductor sectors. 5. Safety & Maintenance · Liner plates protect chamber walls, reducing maintenance downtime. · Interlocks prevent damage from operational errors. Summary: This excels in high-repeatability, multi-material deposition, and automation, catering to both cutting-edge research and specialized industrial coating needs. Why Choose? 1. 4-Target Multi-Mode Sputtering (DC + RF + Strong Magnetic Field) · Unique Feature: Only system in its class offering 3 standard-field targets + 1 strong-field target in a compact design. · Competitor Comparison: Most systems provide only DC or RF targets separately, limiting material compatibility. · Client Benefit: Enables simultaneous deposition of metals, insulators, and alloys (e.g., Cu+Al₂O₃+Ni) without breaking vacuum. 2. Ultra-High Vacuum with Rapid Recovery (<100 min to 5×10⁻⁴ Pa) · Unique Feature: Patented bypass pumping + dry nitrogen venting reduces pump-down time by 40% vs. industry average. · Competitor Comparison: Comparable systems often require 3+ hours to reach working vacuum after venting. · Client Benefit: Dramatically improves throughput for batch processing (e.g., 8–10 runs/day vs. 4–5 with competitors). 3. Integrated Ion-Assisted Deposition (IAD) for Superior Film Quality · Unique Feature: Built-in anode-layer ion source for in-situ cleaning + energy-enhanced deposition. · Competitor Comparison: Most systems require external ion guns (added cost/complexity). · Client Benefit: Achieves >2x better adhesion (passes 10+ tape tests vs. industry-standard 3) and denser films for optical/barrier coatings.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); 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