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- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
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High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget
High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget Model: TMAX-PC-JS07-High Vacuum & Multilayer & Multitarget Key Features & Applications The TMAX-PC-JS07 is designed for nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor layers, and dielectric films. Ideal for research institutions and universities, it supports both material science studies and small-batch production. System Components · Vacuum chamber system (sputtering chamber) · Target & power supply system · Sample stage system · Vacuum pumping & measurement system · Gas flow system · Control system · Film thickness monitoring system · Top cover lifting mechanism · Electrical control system · Computer-controlled system & auxiliary components Technical Specifications Parameter Value Ultimate Vacuum 6.7×10-5 Pa System Leak Rate 1×10-7 Pa·L/S Vacuum Recovery Time ≤40 min to 6.6×10 Pa (after N2 purge) Chamber Design Round chamber, Ø450×350 mm Sample Stage 3-inch × 3-inch (3.2 mm thick) Heating Temperature 600°C ±1°C (programmable) Sample Rotation Self-rotation: 0–50 RPM (uniformity) Revolution: Position-switching capability Magnetron Target 3 targets (standard) Effective Sputtering Area: 3-inch × 3-inch Type: Permanent magnet, brazed indirect water-cooled Deposition Mode Upward sputtering (planar target) Substrate Bias Voltage Up to –200 V Gas Flow System 2-channel mass flow controller Thickness Monitor Quartz crystal sensor (0–999,999 Å) Pumping Options Turbo molecular pump / Cryogenic pump + Dry scroll pump Control & Automation · Real-time monitoring: Tracks displacement and revolution speed. · Error analysis: Displays deviations via curves/numerical data. · Flexible display: Switch between linear and logarithmic scales for revolution speed vs. displacement. · Advanced modes: Supports fixed-point deposition and resistive evaporation coating. Why Choose? ✔ High Precision: Programmable heating (±1°C) and dual-axis sample motion ensure uniform film growth. ✔ Versatile Configurations: Compatible with multiple target materials and pumping systems. ✔ Research-Oriented: Combines in-situ thickness control with automated process logging for reproducible results. Ideal for: Advanced material research, optical coatings, semiconductor layers, and protective coatings development. html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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