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contact us
- If you have questions, please contact us, all questions will be answered
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Add : No. 39, Xinchang Road, Xinyang, Haicang Dist., Xiamen, Fujian, China (Mainland)
High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget
Model Number:
TMAX-PC-JS07Input Power:
2000WCompliance:
CE CertifiedWarranty:
One Year limited warranty with lifetime supportShipping Port:
XiamenMOQ:
1Payment:
L/C D/A D/P T/T Western UnionDelivery Time:
5 days
- WhatsApp : +86 18659217588
- Email : David@tmaxcn.com
- Email : Davidtmaxcn@gmail.com
- Wechat : 18659217588
Previous:
Dual-Target PVD Sputtering Machine For Conductive And Biological Multilayer FilmsNext:
4-Target Multilayer Film Metal PVD Sputtering Deposition System
High-Precision Magnetron Sputtering Deposition PVD Machine For Multilayer & Multitarget
Model: TMAX-PC-JS07-High Vacuum & Multilayer & Multitarget
Key Features & Applications
The TMAX-PC-JS07 is designed for nano-scale single-layer and multilayer functional films, including hard coatings, metallic films, semiconductor layers, and dielectric films. Ideal for research institutions and universities, it supports both material science studies and small-batch production.
System Components
· Vacuum chamber system (sputtering chamber)
· Target & power supply system
· Sample stage system
· Vacuum pumping & measurement system
· Gas flow system
· Control system
· Film thickness monitoring system
· Top cover lifting mechanism
· Electrical control system
· Computer-controlled system & auxiliary components
Technical Specifications
Parameter |
Value |
Ultimate Vacuum |
6.7×10-5 Pa |
System Leak Rate |
1×10-7 Pa·L/S |
Vacuum Recovery Time |
≤40 min to 6.6×10 Pa (after N2 purge) |
Chamber Design |
Round chamber, Ø450×350 mm |
Sample Stage |
3-inch × 3-inch (3.2 mm thick) |
Heating Temperature |
600°C ±1°C (programmable) |
Sample Rotation |
Self-rotation: 0–50 RPM (uniformity) Revolution: Position-switching capability |
Magnetron Target |
3 targets (standard) Effective Sputtering Area: 3-inch × 3-inch Type: Permanent magnet, brazed indirect water-cooled |
Deposition Mode |
Upward sputtering (planar target) |
Substrate Bias Voltage |
Up to –200 V |
Gas Flow System |
2-channel mass flow controller |
Thickness Monitor |
Quartz crystal sensor (0–999,999 Å) |
Pumping Options |
Turbo molecular pump / Cryogenic pump + Dry scroll pump |
Control & Automation
· Real-time monitoring: Tracks displacement and revolution speed.
· Error analysis: Displays deviations via curves/numerical data.
· Flexible display: Switch between linear and logarithmic scales for revolution speed vs. displacement.
· Advanced modes: Supports fixed-point deposition and resistive evaporation coating.
Why Choose?
✔ High Precision: Programmable heating (±1°C) and dual-axis sample motion ensure uniform film growth.
✔ Versatile Configurations: Compatible with multiple target materials and pumping systems.
✔ Research-Oriented: Combines in-situ thickness control with automated process logging for reproducible results.
Ideal for: Advanced material research, optical coatings, semiconductor layers, and protective coatings development.
+86 13174506016
David@tmaxcn.com
