RF+DC Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

RF+DC  Magnetron Ion Sputtering Coater Coating Machine For Non-Metals, Oxide, Ceramics

Model: TMAX-BY-JS12| – Product Specifications

Technical Specifications

Key Features & Applications

Core Advantages

1. Multi-Mode Sputtering

Supports RF (Radio Frequency), DC (Direct Current), and RF+DC Hybrid modes for conductive, insulating, and composite material coatings.

2. High Vacuum Stability

Turbo molecular pump (300 L/s) combined with a rotary pump ensures an ultimate vacuum of 5×10⁻⁴ Pa, guaranteeing high-purity and uniform films.

3. Flexible Compatibility

·Chamber size (φ260mm × 200mm) accommodates small to medium-sized samples.

·φ50mm target supports copper and weakly magnetic materials for diverse applications.

4. Efficient Cooling System

·Water-cooled target minimizes thermal load during high-power sputtering.

· Air-cooled pump reduces maintenance costs for continuous operation.

Typical Applications

·Research Fields
Thin film deposition, nanostructured coatings, semiconductor device development.

·Industrial Uses
Optical coatings, wear-resistant layers, surface modification of electronic components.