Small Multi-target Metal Ion Sputtering Coater Machine

Small Multi-target Metal Ion Sputtering Coater Machine 

TMAX-BY-JS11-Triple-Target Ion Sputtering Coater – Product Specifications

Key Features

· Triple-target design for multi-material deposition in a single run

· DC sputtering technology ensures reliable, high-quality thin-film coating

· Versatile applications for SEM sample preparation, conductive layer coating, and protective film deposition

· Adjustable parameters (gas, current, vacuum) for optimized film properties

Technical Specifications

Why Choose this?

✔ Multi-material coating – Deposit three different materials without breaking vacuum
✔ Enhanced SEM imaging – Reduces charging effects on non-conductive samples
✔ Precision control – Adjustable gas flow, current, and vacuum for optimal film uniformity
✔ Wide compatibility – Supports biological, polymer, and advanced material samples

Applications

· Electron-beam-sensitive samples (e.g., biological, polymers): Protective coating prevents beam damage

· Non-conductive samples: Eliminates charging effects for crisp SEM imaging

· Advanced materials research: Electrode fabrication and thin-film studies

Standard Package Includes

· Main unit with triple-target configuration

· Gold target (50mm × 0.1mm)

· High-performance vacuum pump

· Adjustable sample stage (50mm/70mm)

Optional Accessories

· Additional target materials (Ag, Al, Pt, etc.)

· Custom sample stage sizes

Note: This machine is ideal for research labs, material science, and electron microscopy applications. Custom configurations available upon request.

Optimized for Performance · Designed for Researchers

(For detailed inquiries, contact our technical team for tailored solutions.)