5 Heads RF Plasma Magnetron Sputtering Coater Machine for MGI Thin Film Research

Customized 5 Heads RF Plasma Magnetron Sputtering Coater for MGI Thin Film Research

RF Sputtering Coater System For Solar, OLED & Semiconductor

 RF Sputtering Coater System For Solar, OLED & Semiconductor   Model:  TMAX-PD-JS05-Wafer Sputtering Coater System Product Overview The TMAX-PD-JS05 magnetron sputtering system is equipped with multiple sputtering sources, capable of depositing metallic, semiconducting, and dielectric materials. It supports the fabrication of multilayer thin films and co-sputtered alloy films with high precision. Key Features · Compact & Integrated Design: Space-saving layout with refined aesthetics, optional sample-loading functionality. · High Uniformity Coating: Features 4× magnetron sputtering targets (2–4 inches), compatible with 2–8 inch wafers. Substrate holder ensures uniformity within ±3%–5% for 8-inch wafers. · Flexible Control Options: Siemens PLC + touchscreen (manual/automatic) or PC + PLC full-automatic control. Technical Specifications · System Dimensions (L×W×H): 1400 × 1300 × 1900 mm · Chamber Dimensions (L×W×H): 500 × 500 × 500 mm (PD-500C) / 600 × 600 × 500 mm (PD-600C) · Substrate Stage: Max heating temperature 500–800°C · Base Pressure: ≤5 × 10⁻⁵ Pa · Pumping & Holding: Achieves 8 × 10⁻⁴ Pa within ≤30 min; pressure rise ≤8 Pa over 12 hours. · Target Configuration: 4× sputter guns (2–3 inches or 2–4 inches), coating area 2–6 inches. Applications & Advantages Ideal for R&D and small-batch production, the PD-500C/600C excels in depositing high-quality, uniform thin films for optics, electronics, and functional coatings. Its modular control and excellent temperature/vacuum stability cater to advanced material research and industrial precision demands. TMAX-PD-JS05 vs. Conventional Model Feature   Conventional Systems Advantage Uniformity (8-inch wafer) ±3%–5% ±5%–10% or worse Higher film consistency for precision applications System Footprint Compact (1400×1300×1900 mm) 30–50% larger Saves lab/cleanroom space Substrate Heating 500–800°C Typically 300–600°C Supports high-temperature depositions (e.g., oxides, nitrides) Base Vacuum ≤5×10⁻⁵ Pa ~1×10⁻⁴ Pa Better for reactive sputtering, reduced contamination Pressure Stability ≤8 Pa over 12 hours Frequent drift (>10 Pa in hours) Longer process stability Control Options PLC + Touchscreen or PC + PLC Manual or basic PLC Flexible automation, better reproducibility Target Configuration 4× guns (2–4 inch) Often 2–3 guns (2–3 inch) Wider material selection, co-sputtering capability Coating Area 2–8 inch wafers Typically ≤6 inch Broader substrate compatibility Key Takeaways · Precision & Consistency: Superior uniformity (±3–5%) vs. conventional (±5–10%). · Compact & Efficient: 30% smaller footprint without sacrificing performance. · High-Temp & Vacuum Stability: Enables advanced materials (e.g., optical coatings, semiconductors). · Automation Ready: PC-controlled processes improve repeatability over manual systems. Ideal For: R&D labs, semiconductor fabs, and optical coating producers needing high-repeatability, multi-material deposition in a space-efficient design.       html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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