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  • Sputter Coater for SEM Sample Preparation SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal

    SEM Low-Temperature Mini Magnetron Sputtering System For Au, Ag, Al, Metal      Glovebox-Compatible SEM Sample Coater for Beam-Sensitive Materials 1. System Overview ✔ Non-conductive sample coating (Au/Ag/Pt) for SEM imaging ✔ Temperature-sensitive substrates (<60°C process temp) ✔ High-quality thin film deposition with minimized thermal damage 2.  Core parameter Parameter Specification Ultimate Vacuum 4×10⁻² mbar Base Vacuum 1 Pa Pump Down Time <1 minute Vacuum Pump Rotary Vane (2 L/s, Oil-lubricated) Vacuum Measurement Mechanical Gauge (Atmosphere-10⁻² mbar) 3. Cold Sputtering Technology: Patented magnetic confinement reduces substrate heating 4. Glovebox-Adaptable: Optional configuration for inert atmosphere processing Parameter Specification Model TMAX-BY-JS08 Sputtering Type DC Magnetron (Physical Vapor Deposition) Target Materials (Standard) Au (50mmØ×0.1mm) Optional Target Materials Ag, Pt, Cr Maximum Substrate Size Ø70mm (customizable) Chamber Material Borosilicate Glass (160mmØ×120mmH) System Dimensions (W×D×H) 300×360×380 mm Weight 28 kg    

  • Sputter Coater for SEM Sample Preparation Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological

    Magnetron Sputtering Deposition System For Functional Film Of SEM, Battery, Biological       Model: TMAX-ZK-JS03-Coater for Delicate & Oxidation-Sensitive Samples Of SEM, Battery, Biological Product Highlights · User-friendly LCD touchscreen for simplified operation · Fully automated vacuum process for sample preparation · Automatic gas release for safe handling · Wide sputtering current range (5–45mA) for flexible applications · High sputtering efficiency for fast, uniform coating · Ultra-fine particle size (6–10nm) for superior film quality · No sample surface heating—ideal for temperature-sensitive materials Applications Designed for integration into gloveboxes, this sputtering coater is ideal for oxidizable, contamination-sensitive samples, including: · SEM sample preparation · Electrode material research · Battery separators, filtration membranes · Biological specimens & delicate substrates Technical Specifications Core Parameters Parameter Specification Sputtering Current 5–45mA (adjustable) Operating Mode Fully automatic magnetron sputtering Sputtering Voltage 600V (fixed) Target Materials Gold or Platinum (standard, select one); optional: Ag, Ti, Cr, Al, Cu, Pb Vacuum Level <1Pa Vacuum Pump Oil-sealed rotary vane pump (1L/s); optional dry scroll pump Additional Features · Chamber Dimensions: Ø128×130mm · Sample Holders: 1ר90mm, 4ר25mm, 6ר15mm cups · Power Supply: 220V/50Hz (110V customizable) · Max Power Consumption: 450W · Particle Size: 6–10nm · Working Gas: Air or argon · Protection Mechanisms: Overcurrent cutoff (>50mA), vacuum interlock (>100Pa) Key Advantages · Uniform, fine-grained coatings with excellent adhesion · Zero thermal damage—perfect for heat-sensitive substrates (e.g., polymers, biomaterials) · Compact glovebox-compatible design for inert-atmosphere processing Why Choose? This system combines high-performance sputtering with glovebox compatibility, ensuring contamination-free deposition for advanced materials research. Its cold sputtering capability and sub-10nm particle size make it a top choice for critical applications in energy storage, life sciences, and nanotechnology.     html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/flash.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-rm { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/rm.gif); background-position:center center; background-repeat:no-repeat; width:100px; height:100px; } img.ke-media { border:1px solid #AAA; background-image:url(https://www.lithmachine.com/js/htmledit/kindeditor/themes/common/media.gif); 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