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  • Sputter Coater for SEM Sample Preparation Multi-Material Evaporation Deposition Coating System Machine For OLED, Solar Cell & Semiconductor

    Multi-Material Evaporation Deposition Coating System Machine For OLED, Solar Cell & Semiconductor   TMAX-TK-ZD02-High-Vacuum Multi-Material Evaporation Technical Specifications Category Parameter Specification Basic Configuration Model TMAX-TK-ZD02   Coating Method Multi-source evaporation deposition   Chamber Structure Vertical square, front-opening design Vacuum System Chamber Dimensions Ø400mm × H500mm (Material: 304 stainless steel)   Ultimate Vacuum ≤6.0×10⁻⁴ Pa   Pump-down Time ≤45 min (Atmosphere→10⁻⁴ Pa)   Pump Configuration Compound molecular pump (FF-200/1200, 1200L/s) + Rotary vane pump (TRP-36, 9L/s)   Vacuum Valves GDQ-200 main valve + GDQ-40 bypass valve Deposition Control Heating Temperature Room temperature ~ 300°C   Substrate Holder 120mm×120mm (Custom sizes available)   Film Uniformity ≤±5.0%   Evaporation Sources 3 groups (Boat-type + Filament-type for metals) with baffles   Thickness Control Quartz crystal monitor (Optional, 1 water-cooled probe)  Operational Control System PLC + Touchscreen   Safety Protection Water shortage/Overcurrent/Voltage fault alarms   Power Requirement ≥8kW   Dimensions 1710mm(L)×850mm(W)×1850mm(H) Standard configuration: Manual button control. Quartz crystal monitor available as optional accessory. Key Features & Applications ◉ Modular Design · Integrated vacuum chamber with automated welding and surface treatment · Hybrid sealing (metal + fluororubber) for optimal vacuum maintenance ◉ Process Flexibility · Simultaneous evaporation of metals (Al, Ag, Au, etc.) and organic materials · Adjustable baffles for deposition uniformity control ◉ User-Oriented · Explicit "Optional" labeling for thickness monitoring system · Customizable substrate holders for specialized research needs ◉ Target Applications     Novel thin-film material development     Optoelectronic device research (OLED, thin-film solar cells)     Small-batch functional coating production Advantages Parameter Entry-Lab Systems Industrial Systems Evaporation Sources 3 independent (metal/organic hybrid) 1-2 single-type sources 4-6 (customized) Thickness Control ±5.0% (upgradable to ±2.0%) ±8-10% (no real-time monitoring) ±1-3% (multi-probe standard) Heating Rate 10°C/min (RT→300°C) ≤5°C/min 15-20°C/min (high-temp) Leak Rate ≤5×10⁻⁹ Pa·m³/s (metal seals) ≤1×10⁻⁷ Pa·m³/s (rubber seals) ≤1×10⁻¹⁰ Pa·m³/s Maintenance Cycle 500hrs (turbo pump) 300hrs 1000hrs (mag-lev pumps) Coating Area 144cm² (expandable to 400cm²) 50-100cm² 1000cm²+ Ideal for: ✓ Bridging lab-scale R&D and production verification ✓ Cross-disciplinary material research teams ✓ Budget-conscious innovators demanding industrial-grade performance   html {margin:0;padding:0;} body {margin:0;padding:5px;} body, td {font:12px/1.5 "sans serif",tahoma,verdana,helvetica;} body, p, div {word-wrap: break-word;} p {margin:5px 0;} table {border-collapse:collapse;} img {border:0;} noscript {display:none;} table.ke-zeroborder td {border:1px dotted #AAA;} img.ke-flash { border:1px solid #AAA; 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